Hoekstra M F, Malone R E
Mutat Res. 1987 Jun;178(2):201-10. doi: 10.1016/0027-5107(87)90270-3.
The reml mutations of Saccharomyces cerevisiae confer a semi-dominant hyper-recombination/hyper-mutation phenotype. Neither reml mutant allele has any apparent meiotic affect. We have examined spontaneous mutation in reml-2 strains and demonstrate that the reml-2 mutation, like reml-1, confers an average 10-fold increase in reversion and forward mutation rates. Unlike certain yeast rad mutations with phenotypes similar to reml, strains containing reml are resistant to MMS and only slightly UV sensitive at very high doses. To understand the mutator phenotype of reml, we have used a double-mutant approach, combining the reml mutation with radiation-sensitive mutations affecting DNA repair. Double mutants of reml-2 and a mutation in the yeast error-prone repair group (rad6-1) or a mutation in excision repair (rad1-2 or rad4) maintain the hyper-mutation phenotype. Since mutation rates remain elevated in these double-mutant strains, it appears as if the mutations which occur in the presence of reml resemble spontaneous mutation since they do not require the action of a repair system.
酿酒酵母的reml突变赋予了一种半显性的高重组/高突变表型。两个reml突变等位基因均未产生任何明显的减数分裂效应。我们检测了reml-2菌株中的自发突变，并证明reml-2突变与reml-1一样，使回复突变和正向突变率平均增加了10倍。与某些表型与reml相似的酵母rad突变不同，含有reml的菌株对甲基磺酸甲酯（MMS）具有抗性，并且仅在非常高的剂量下对紫外线略有敏感。为了理解reml的突变体表型，我们采用了双突变方法，将reml突变与影响DNA修复的辐射敏感突变相结合。reml-2与酵母易错修复组中的突变（rad6-1）或切除修复中的突变（rad1-2或rad4）的双突变体保持高突变表型。由于这些双突变菌株中的突变率仍然升高，因此在reml存在的情况下发生的突变似乎类似于自发突变，因为它们不需要修复系统的作用。
