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Interface between Water-Solvent Mixtures and a Hydrophobic Surface.

作者信息

Prihoda Annemarie, Will Johannes, Duchstein Patrick, Becit Bahanur, Lossin Felix, Schindler Torben, Berlinghof Marvin, Steinrück Hans-Georg, Bertram Florian, Zahn Dirk, Unruh Tobias

机构信息

Institute for Crystallography and Structural Physics (ICSP), Friedrich-Alexander-Universität Erlangen-Nürnberg, Staudtstr. 3, 91058 Erlangen, Germany.

Center for Nanoanalysis and Electron Microscopy (CENEM) and Interdisciplinary Center for Nanostructured Films (IZNF), Friedrich-Alexander-Universität Erlangen-Nürnberg, Cauerstr. 3, 91058 Erlangen, Germany.

出版信息

Langmuir. 2020 Oct 13;36(40):12077-12086. doi: 10.1021/acs.langmuir.0c02745. Epub 2020 Sep 30.

DOI:10.1021/acs.langmuir.0c02745
PMID:32960065
Abstract

The mechanism behind the stability of organic nanoparticles prepared by liquid antisolvent (LAS) precipitation without a specific stabilizing agent is poorly understood. In this work, we propose that the organic solvent used in the LAS process rapidly forms a molecular stabilizing layer at the interface of the nanoparticles with the aqueous dispersion medium. To confirm this hypothesis, -octadecyltrichlorosilane (OTS)-functionalized silicon wafers in contact with water-solvent mixtures were used as a flat model system mimicking the solid-liquid interface of the organic nanoparticles. We studied the equilibrium structure of the interface by X-ray reflectometry (XRR) for water-solvent mixtures (methanol, ethanol, 1-propanol, 2-propanol, acetone, and tetrahydrofuran). The formation of an organic solvent-rich layer at the solid-liquid interface was observed. The layer thickness increases with the organic solvent concentration and correlates with the polar and hydrogen bond fraction of Hansen solubility parameters. We developed a self-consistent adsorption model via complementing adsorption isotherms obtained from XRR data with molecular dynamics simulations.

摘要

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