Xu Shen, Wang Wu, Li Hui, Zhang Jingyu, Chen Runfeng, Wang Shuang, Zheng Chao, Xing Guichuan, Song Chunyuan, Huang Wei
Key Laboratory for Organic Electronics and Information Displays & Jiangsu Key Laboratory for Biosensors, Institute of Advanced Materials (IAM), Jiangsu National Synergistic Innovation Center for Advanced Materials (SICAM), Nanjing University of Posts and Telecommunications, 9 Wenyuan Road, Nanjing, 210023, People's Republic of China.
Institute of Applied Physics and Materials Engineering, University of Macau, Macao SAR, 999078, China.
Nat Commun. 2020 Sep 23;11(1):4802. doi: 10.1038/s41467-020-18572-9.
Blue/deep-blue emission is crucial for organic optoelectronics but remains a formidable challenge in organic afterglow due to the difficulties in populating and stabilizing the high-energy triplet excited states. Here, a facile strategy to realize the efficient deep-blue organic afterglow is proposed via host molecules to sensitize the triplet exciton population of guest and water implement to suppress the non-radiative decays by matrices rigidification. A series of highly luminescent deep-blue (405-428 nm) organic afterglow materials with lifetimes up to 1.67 s and quantum yields of 46.1% are developed. With these high-performance water-responsive materials, lifetime-encrypted rewritable paper has been constructed for water-jet printing of high-resolution anti-counterfeiting patterns that can retain for a long time (>1 month) and be erased by dimethyl sulfoxide vapor in 15 min with high reversibility for many write/erase cycles. These results provide a foundation for the design of high-efficient blue/deep-blue organic afterglow and stimuli-responsive materials with remarkable applications.
蓝光/深蓝色发射对于有机光电器件至关重要,但由于在填充和稳定高能三重态激发态方面存在困难,在有机余辉中仍然是一个巨大的挑战。在此,提出了一种简便的策略来实现高效的深蓝色有机余辉,即通过主体分子敏化客体的三重态激子填充,并用水来抑制基质的非辐射衰变以实现基质刚性化。开发了一系列高发光的深蓝色(405-428nm)有机余辉材料,其寿命长达1.67秒,量子产率为46.1%。利用这些高性能的水响应材料,构建了寿命加密的可重写纸,用于水喷射打印高分辨率防伪图案,这些图案可以长时间保留(>1个月),并在15分钟内被二甲基亚砜蒸汽擦除,具有高可逆性,可进行多次写入/擦除循环。这些结果为设计具有显著应用的高效蓝光/深蓝色有机余辉和刺激响应材料奠定了基础。