基于阴极电弧的宽束等离子体阴极电子束源，用于在宽脉冲宽度范围内产生电子束。

Broad-beam plasma-cathode electron beam source based on a cathodic arc for beam generation over a wide pulse-width range.

作者信息

Kazakov A V, Medovnik A V, Oks E M, Panchenko N A

机构信息

Tomsk State University of Control System and Radioelectronics, Tomsk 634050, Russia.

出版信息

Rev Sci Instrum. 2020 Sep 1;91(9):093304. doi: 10.1063/5.0023172.

DOI:10.1063/5.0023172

PMID:33003797

Abstract

We describe the design, parameters, and characteristics of a modified wide-aperture, plasma-cathode electron beam source operating in the pressure range of 3 Pa-30 Pa and generating large-radius, low-energy (up to 10 keV) electron beams with a pulse width varying from 0.05 ms to 20 ms and a beam current up to several tens of amperes. A pulsed cathodic arc is used to generate the emission plasma, and a DC accelerating voltage is used to form the electron beam. Modernization of the design and optimization of the operating conditions of the electron source have provided a multiple increase in the pulse duration of the electron beam current and the corresponding increase in the beam energy per pulse, as compared to previously developed pulsed forevacuum electron sources.

摘要

我们描述了一种改进的宽孔径、等离子体阴极电子束源的设计、参数和特性，该电子束源在3 Pa至30 Pa的压力范围内运行，可产生大半径、低能量（高达10 keV）的电子束，脉冲宽度从0.05 ms到20 ms不等，束流高达几十安培。采用脉冲阴极电弧产生发射等离子体，并使用直流加速电压形成电子束。与先前开发的脉冲前级真空电子源相比，电子源设计的现代化和运行条件的优化使电子束电流的脉冲持续时间成倍增加，且每个脉冲的束能量相应增加。