Bakeev I Yu, Klimov A S, Oks E M, Zenin A A
Tomsk State University of Control Systems and Radioelectronics, Tomsk 634050, Russia.
Rev Sci Instrum. 2019 Feb;90(2):023302. doi: 10.1063/1.5078655.
We present the results of our investigations of magnetic focusing of the electron beam generated by a plasma-cathode electron source in the forevacuum pressure range (10-30 Pa). We show that a magnetic double-focusing system employing two separate field coils with the main magnetic coil located close to the beam collector at the focal plane provides effective and efficient focusing of the electron beam. With our e-beam source, this focusing system produces a power density of more than 1 MW/cm at the electron beam focus with an accelerating voltage of 30 kV and a beam current up to 60 mA. For comparison, the maximum beam power density provided by plasma-cathode electron sources at pressures of less than 0.1 Pa is at the level of 10 MW/cm.
我们展示了在低真空压力范围（10 - 30帕斯卡）内，对由等离子体阴极电子源产生的电子束进行磁聚焦的研究结果。我们表明，一种磁双聚焦系统，采用两个独立的励磁线圈，主磁线圈位于焦平面处靠近电子束收集器的位置，可实现电子束的高效聚焦。对于我们的电子束源，在加速电压为30千伏、束流高达60毫安的情况下，该聚焦系统在电子束焦点处产生的功率密度超过1兆瓦/平方厘米。相比之下，在压力小于0.1帕斯卡时，等离子体阴极电子源提供的最大束流功率密度处于10兆瓦/平方厘米的水平。
