Zhang Li-Juan, Yang Bin, Li Da-Zhi, Farooq Umar, Xu Xi-Ling, Zheng Wei-Jun, Xu Hong-Guang
College of Chemical Engineering and Safety Engineering, Binzhou University, Binzhou 256600, Shandong, China.
Beijing National Laboratory for Molecular Sciences, State Key Laboratory of Molecular Reaction Dynamics, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China.
Phys Chem Chem Phys. 2020 Oct 21;22(40):22989-22996. doi: 10.1039/d0cp04101g.
The structural and electronic properties of V-doped silicon clusters, VSi10-/0 and VSi11-/0, were investigated by using mass-selected anion photoelectron spectroscopy in combination with theoretical calculations. Photoelectron spectroscopy of VSi10- and VSi11- clusters with spectral similarity reveals that the two cluster structures resemble each other. Interestingly, theoretical calculation studies provide definitive evidence of the global minima for the two clusters to be V-encapsulated tetragonal prism motifs with extra Si atoms bicapped and tricapped, respectively. The enhanced stability of the tetragonal prism unit in VSi10- and VSi11- is due to the strong interactions between 3d (V) and 3p (Si) orbitals, and more charge transfers from the Sin framework to the encapsulated V atom. The tetragonal prism unit possessed by both the VSi10- and VSi11- clusters is observed for the first time in the current work, and may offer new ideas in developing components for Si-based nanodevices.
采用质量选择阴离子光电子能谱结合理论计算的方法,研究了V掺杂硅团簇VSi10-/0和VSi11-/0的结构和电子性质。具有光谱相似性的VSi10-和VSi11-团簇的光电子能谱表明,这两种团簇结构彼此相似。有趣的是,理论计算研究提供了确凿的证据,表明这两个团簇的全局最小值分别是具有额外Si原子双帽和三帽的V封装四方棱柱 motif。VSi10-和VSi11-中四方棱柱单元稳定性的增强是由于3d(V)和3p(Si)轨道之间的强相互作用,以及更多的电荷从Sin框架转移到封装的V原子。VSi10-和VSi11-团簇都具有的四方棱柱单元在当前工作中首次被观察到,这可能为开发基于Si的纳米器件组件提供新的思路。