Jucius Dalius, Lazauskas Algirdas, Grigaliūnas Viktoras, Guobienė Asta, Puodžiukynas Linas
Institute of Materials Science, Kaunas University of Technology, K. Baršausko 59, LT51423 Kaunas, Lithuania.
Department of Physics, Kaunas University of Technology, Studentu St. 50, LT51368 Kaunas, Lithuania.
Polymers (Basel). 2020 Oct 6;12(10):2291. doi: 10.3390/polym12102291.
This paper presents the first attempt to texturize a fully crosslinked thermoset shape memory polymer using a hot embossing technique. UV-cured thiol-ene films were successfully embossed with anisotropically-etched Si (100) stamps at a temperature of 100 °C, which is about 50 °C above the glass transition temperature of the polymer. The low storage modulus of the polymer in a rubbery state allowed us to permanently emboss random micro-pyramidal patterns onto the surface of the film with high fidelity by applying 30 MPa pressure for 1 h. Atomic force microscopy (AFM) investigation showed perfect replication of the stamp micropattern with typical height of the largest inverted pyramids close to 0.7 µm and lateral dimensions in the range of 1-2 µm. Changes in surface roughness parameters of the embossed thiol-ene films after annealing them at 100 °C for 1 h or storing for 2 months in air at standard room conditions were negligible. The achieved results open new perspectives for the simple and inexpensive hot embossing technique to be applied for the micropatterning of prepolymerized thermoset shape memory films as an alternative to micropatterning using UV casting.
本文首次尝试使用热压印技术对完全交联的热固性形状记忆聚合物进行纹理化处理。在100℃的温度下，用各向异性蚀刻的Si(100)模板成功地对紫外光固化硫醇-烯薄膜进行了压印，该温度比聚合物的玻璃化转变温度高约50℃。聚合物在橡胶态下的低储能模量使我们能够通过施加30MPa的压力1小时，将随机的微金字塔图案以高保真度永久压印在薄膜表面。原子力显微镜(AFM)研究表明，模板微图案得到了完美复制，最大倒金字塔的典型高度接近0.7μm，横向尺寸在1-2μm范围内。在100℃下退火1小时或在标准室温条件下在空气中储存2个月后，压印硫醇-烯薄膜的表面粗糙度参数变化可忽略不计。所取得的结果为简单且廉价的热压印技术开辟了新的前景，该技术可用于预聚合热固性形状记忆薄膜的微图案化，作为使用紫外浇铸进行微图案化的替代方法。
