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在二甲基亚砜中从甲磺酸铟(III)进行铟的电沉积。

Indium electrodeposition from indium(iii) methanesulfonate in DMSO.

作者信息

Monnens Wouter, Deferm Clio, Binnemans Koen, Fransaer Jan

机构信息

KU Leuven, Department of Materials Engineering, Kasteelpark Arenberg 44, bus 2450, B-3001 Heverlee, Belgium.

出版信息

Phys Chem Chem Phys. 2020 Nov 14;22(42):24526-24534. doi: 10.1039/d0cp03277h. Epub 2020 Oct 22.

DOI:10.1039/d0cp03277h
PMID:33090148
Abstract

The electrochemical behavior and electrodeposition of indium was investigated at 26 °C and 160 °C from a solution composed of indium(iii) methanesulfonate and dimethylsulfoxide (DMSO). Indium(iii) methanesulfonate was synthesized from indium(iii) oxide and methanesulfonic acid (MSA). Cyclic voltammetry, quartz crystal microbalance measurements and rotating ring disk electrode experiments indicated that reduction of indium(iii) to both indium(i) and indium(0) occurs. Yet, reduction to metallic indium was found to be the predominant process. Deposited indium could be stripped to indium(i). This unstable species disproportionated to indium(iii) and indium(0), leading to the formation of micron-sized metallic indium particles in the electrolyte. At 26 °C, indium deposited on glassy carbon as smooth, flat films whereas at 160 °C, it deposits as droplets.

摘要

在26℃和160℃下,从由甲磺酸铟(III)和二甲基亚砜(DMSO)组成的溶液中研究了铟的电化学行为和电沉积过程。甲磺酸铟(III)由氧化铟(III)和甲磺酸(MSA)合成。循环伏安法、石英晶体微天平测量和旋转环盘电极实验表明,铟(III)还原为铟(I)和铟(0)均会发生。然而,发现还原为金属铟是主要过程。沉积的铟可以被剥离为铟(I)。这种不稳定的物种歧化为铟(III)和铟(0),导致在电解质中形成微米级的金属铟颗粒。在26℃下,铟沉积在玻碳电极上形成光滑、平整的薄膜,而在160℃下,它以液滴形式沉积。

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