Basiaga Marcin, Walke Witold, Antonowicz Magdalena, Kajzer Wojciech, Szewczenko Janusz, Domanowska Alina, Michalewicz Anna, Szindler Marek, Staszuk Marcin, Czajkowski Miłosz
Faculty of Biomedical Engineering, Silesian University of Technology, Roosevelta 40, 41-800 Zabrze, Poland.
Institute of Physics-Centre of Science and Education, Silesian University of Technology, 44-100 Gliwice, Poland.
Materials (Basel). 2020 Oct 26;13(21):4767. doi: 10.3390/ma13214767.
The main goal of the carried out tests was to analyze the influence of the surface modification of a substrate by depositing composite ZnO layers by the Atomic Layer Deposition (ALD) method. The samples were subjected to preliminary surface modification consisting of being sandblasted and electropolished. A ZnO layer was applied to the prepared substrates by the ALD method. As a precursor of ZnO, diethylzinc (DEZ) was used, which reacted with water, enabling the deposition of the thin films. The chamber temperature was as follows: T = 100-300 °C. The number of cycles was 500 and 1500. As part of the assessment of the physicochemical properties of the resulting surface layers, the tests of chemical composition of the layer, pitting corrosion, impedance corrosion, adhesion to the metal substrate, morphology surface, and wettability were carried out. On the basis of the obtained research, it was found that a composite ZnO layer deposited onto a substrate previously subjected to the electrochemical polishing process has more favorable physicochemical properties. Moreover, an influence of temperature and the number of cycles of the deposition process on the obtained properties was observed, where the ZnO layer was characterized by more favorable properties at a temperature of 200-300 °C at 1500 cycles of the deposition process.
所进行测试的主要目标是分析通过原子层沉积(ALD)方法沉积复合ZnO层对基材表面改性的影响。样品进行了包括喷砂和电解抛光在内的初步表面改性。通过ALD方法将ZnO层施加到制备好的基材上。使用二乙基锌(DEZ)作为ZnO的前驱体,它与水反应,从而实现薄膜的沉积。腔室温度如下:T = 100 - 300°C。循环次数为500次和1500次。作为对所得表面层物理化学性质评估的一部分,进行了层的化学成分、点蚀、阻抗腐蚀、与金属基材的附着力、表面形态和润湿性测试。基于所获得的研究,发现沉积在先前经过电化学抛光处理的基材上的复合ZnO层具有更有利的物理化学性质。此外,观察到沉积过程的温度和循环次数对所得性质的影响,其中在沉积过程1500次循环、温度为200 - 300°C时,ZnO层具有更有利的性质。