• 文献检索
  • 文档翻译
  • 深度研究
  • 学术资讯
  • Suppr Zotero 插件Zotero 插件
  • 邀请有礼
  • 套餐&价格
  • 历史记录
应用&插件
Suppr Zotero 插件Zotero 插件浏览器插件Mac 客户端Windows 客户端微信小程序
定价
高级版会员购买积分包购买API积分包
服务
文献检索文档翻译深度研究API 文档MCP 服务
关于我们
关于 Suppr公司介绍联系我们用户协议隐私条款
关注我们

Suppr 超能文献

核心技术专利:CN118964589B侵权必究
粤ICP备2023148730 号-1Suppr @ 2026

文献检索

告别复杂PubMed语法,用中文像聊天一样搜索,搜遍4000万医学文献。AI智能推荐,让科研检索更轻松。

立即免费搜索

文件翻译

保留排版,准确专业,支持PDF/Word/PPT等文件格式,支持 12+语言互译。

免费翻译文档

深度研究

AI帮你快速写综述,25分钟生成高质量综述,智能提取关键信息,辅助科研写作。

立即免费体验

一种原位方法,用于保护内部裂纹/孔隙免受离子束损伤,并减少使用聚焦离子束制备透射电子显微镜(TEM)样品时的拖尾现象。

An in-situ method for protecting internal cracks/pores from ion beam damage and reducing curtaining for TEM sample preparation using FIB.

作者信息

Zhong Xiang Li, Haigh Sarah J, Zhou Xiaorong, Withers Philip J

机构信息

Department of Materials, University of Manchester, Oxford Road, Manchester, M13 9PL, UK; Henry Royce Institute, Department of Materials, University of Manchester, Oxford Road, Manchester, M13 9PL, UK.

Department of Materials, University of Manchester, Oxford Road, Manchester, M13 9PL, UK.

出版信息

Ultramicroscopy. 2020 Dec;219:113135. doi: 10.1016/j.ultramic.2020.113135. Epub 2020 Oct 10.

DOI:10.1016/j.ultramic.2020.113135
PMID:33129062
Abstract

Focused ion beam (FIB) milling has evolved to be one of the most important Transmission Electron Microscope (TEM) site specific sample preparation techniques. However, this technique still poses challenges, such as the structural damage and potential curtaining issues often observed for thin TEM lamella. These artefacts can negatively affect the TEM analysis results. In particular, structures such as internal cracks and pores in FIB prepared TEM samples can often be damaged during sample preparation. This is commonly regarded as an unavoidable problem, even though microstructurally intact thin lamellae TEM samples are widely needed for the investigation of crack tips or pore morphologies in many different materials. This presents a strong driver for the development of innovative methods to overcome damage and curtaining issues during FIB sample preparation. Here we report on a new methodology developed to protect internal cracks and pores from ion beam damage. Our proposed method also mitigates curtaining issues, which often make TEM analysis more difficult. This method uses the FIB to sputter and redeposit material onto the edges of any cracks or pores in order to fill these features in-situ prior to lamella thinning. Case studies showcasing this method are presented, demonstrating the approach on a modular pure iron sample and on a porous laser treated Al/BC composite sample. Our proposed 'filling' method has demonstrated a two key benefits; it preserves the integrity of the edges of any cracks and pores and it reducing curtaining. The results also demonstrate that this technique can be an alternative to conventional Gas Injection System (GIS) deposition for protecting the external top surface.

摘要

聚焦离子束(FIB)铣削已发展成为最重要的透射电子显微镜(TEM)特定部位样品制备技术之一。然而,该技术仍然存在挑战,例如在薄TEM薄片中经常观察到的结构损伤和潜在的拖尾问题。这些伪像会对TEM分析结果产生负面影响。特别是,FIB制备的TEM样品中的内部裂纹和孔隙等结构在样品制备过程中常常会受到损坏。即使在许多不同材料中研究裂纹尖端或孔隙形态广泛需要微观结构完整的薄薄片TEM样品,这通常也被视为一个不可避免的问题。这为开发创新方法以克服FIB样品制备过程中的损伤和拖尾问题提供了强大的动力。在此,我们报告一种新开发的方法,用于保护内部裂纹和孔隙免受离子束损伤。我们提出的方法还减轻了拖尾问题,而拖尾问题常常使TEM分析更加困难。该方法使用FIB将材料溅射并重新沉积到任何裂纹或孔隙的边缘,以便在薄片减薄之前原位填充这些特征。展示了该方法的案例研究,在模块化纯铁样品和多孔激光处理的Al/BC复合样品上演示了该方法。我们提出的“填充”方法已证明有两个关键优点;它保留了任何裂纹和孔隙边缘的完整性并减少了拖尾。结果还表明,该技术可以替代传统的气体注入系统(GIS)沉积来保护外部顶面。

相似文献

1
An in-situ method for protecting internal cracks/pores from ion beam damage and reducing curtaining for TEM sample preparation using FIB.一种原位方法,用于保护内部裂纹/孔隙免受离子束损伤,并减少使用聚焦离子束制备透射电子显微镜(TEM)样品时的拖尾现象。
Ultramicroscopy. 2020 Dec;219:113135. doi: 10.1016/j.ultramic.2020.113135. Epub 2020 Oct 10.
2
Mitigating Curtaining Artifacts During Ga FIB TEM Lamella Preparation of a 14 nm FinFET Device.在14纳米鳍式场效应晶体管(FinFET)器件的镓聚焦离子束透射电子显微镜(Ga FIB TEM)薄片制备过程中减轻拖尾伪像
Microsc Microanal. 2017 Jun;23(3):484-490. doi: 10.1017/S1431927617000241. Epub 2017 Mar 20.
3
Combined Focused Ion Beam-Ultramicrotomy Method for TEM Specimen Preparation of Porous Fine-Grained Materials.用于多孔细粒材料透射电子显微镜样品制备的聚焦离子束-超薄切片联合方法
Microsc Microanal. 2020 Feb;26(1):120-125. doi: 10.1017/S1431927619015186.
4
Comparing Xe pFIB and Ga FIB for TEM sample preparation of Al alloys: Minimising FIB-induced artefacts.比较用于铝合金透射电子显微镜(TEM)样品制备的氙等离子聚焦离子束(Xe pFIB)和镓聚焦离子束(Ga FIB):最小化聚焦离子束诱导的伪像。
J Microsc. 2021 May;282(2):101-112. doi: 10.1111/jmi.12983. Epub 2020 Dec 24.
5
Preparation of transmission electron microscopy cross-section specimens of crack tips using focused ion beam milling.使用聚焦离子束铣削制备裂纹尖端的透射电子显微镜横截面标本。
J Microsc. 2002 Aug;207(Pt 2):129-36. doi: 10.1046/j.1365-2818.2002.01050.x.
6
Wet-chemical etching of FIB lift-out TEM lamellae for damage-free analysis of 3-D nanostructures.用于对三维纳米结构进行无损分析的聚焦离子束取出透射电镜薄片的湿化学蚀刻
Ultramicroscopy. 2020 Sep;216:113049. doi: 10.1016/j.ultramic.2020.113049. Epub 2020 Jun 17.
7
Analysis and comparison of focused ion beam milling and vibratory polishing sample surface preparation methods for porosity study of U-Mo plate fuel for research and test reactors.用于研究和试验反应堆的U-Mo板状燃料孔隙率研究的聚焦离子束铣削和振动抛光样品表面制备方法的分析与比较。
Micron. 2018 Jul;110:57-66. doi: 10.1016/j.micron.2018.04.010. Epub 2018 May 2.
8
Combining Ar ion milling with FIB lift-out techniques to prepare high quality site-specific TEM samples.结合氩离子铣削和聚焦离子束剥离技术来制备高质量的特定位置透射电子显微镜样品。
J Microsc. 2004 Sep;215(Pt 3):219-23. doi: 10.1111/j.0022-2720.2004.01376.x.
9
3D imaging of cells and tissues by focused ion beam/scanning electron microscopy (FIB/SEM).通过聚焦离子束/扫描电子显微镜(FIB/SEM)对细胞和组织进行三维成像。
Methods Mol Biol. 2013;950:275-92. doi: 10.1007/978-1-62703-137-0_16.
10
Nanowire facilitated transfer of sensitive TEM samples in a FIB.纳米线有助于在聚焦离子束中转移敏感的透射电子显微镜样品。
Ultramicroscopy. 2020 Dec;219:113075. doi: 10.1016/j.ultramic.2020.113075. Epub 2020 Jul 15.

引用本文的文献

1
Visualisation and differentiation of binder components in hard carbon composite anodes by osmium tetroxide and uranyl acetate staining.通过四氧化锇和醋酸铀酰染色对硬碳复合阳极中粘结剂成分进行可视化和鉴别
J Microsc. 2025 Sep;299(3):277-286. doi: 10.1111/jmi.70014. Epub 2025 Jul 21.
2
Electrodeposited MoSO/Ni Tribological Coatings.电沉积MoSO/Ni摩擦学涂层。
Langmuir. 2024 Mar 19;40(11):5776-5784. doi: 10.1021/acs.langmuir.3c03518. Epub 2024 Mar 8.