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非均匀核壳结构 InGaN/GaN 纳米线发光二极管的光学与电学关联分析

Correlated optical and electrical analyses of inhomogeneous core/shell InGaN/GaN nanowire light emitting diodes.

作者信息

Zhang H, Piazza V, Neplokh V, Guan N, Bayle F, Collin S, Largeau L, Babichev A, Julien F H, Tchernycheva M

机构信息

School of Microelectronics, Dalian University of Technology, 116024 Dalian, People's Republic of China.

C2N-CNRS, Univ. Paris Saclay, F-91120 Palaiseau, France.

出版信息

Nanotechnology. 2021 Mar 5;32(10):105202. doi: 10.1088/1361-6528/abc70e.

Abstract

The performance of core-shell InGaN/GaN nanowire (NW) light emitting diodes (LEDs) can be limited by wire-to-wire electrical inhomogeneities. Here we investigate an array of core-shell InGaN/GaN NWs which are morphologically identical, but present electrical dissimilarities in order to understand how the nanoscale phenomena observed in individual NWs affect the working performance of the whole array. The LED shows a low number of NWs (∼20%) producing electroluminescence under operating conditions. This is related to a presence of a potential barrier at the interface between the NW core and the radially grown n-doped layer, which differently affects the electrical properties of the NWs although they are morphologically identical. The impact of the potential barrier on the performance of the NW array is investigated by correlating multi-scanning techniques, namely electron beam induced current microscopy, electroluminescence mapping and cathodoluminescence analysis. It is found that the main cause of inhomogeneity in the array is related to a non-optimized charge injection into the active region, which can be overcome by changing the contact architecture so that the electrons become injected directly in the n-doped underlayer. The LED with so-called 'front-n-contacting' is developed leading to an increase of the yield of emitting NWs from 20% to 65%.

摘要

核壳结构的氮化铟镓/氮化镓纳米线(NW)发光二极管(LED)的性能可能会受到线间电不均匀性的限制。在此,我们研究了一组形态相同但电学性质不同的核壳结构氮化铟镓/氮化镓纳米线阵列,以了解在单个纳米线中观察到的纳米级现象如何影响整个阵列的工作性能。该LED在工作条件下显示出少量(约20%)的纳米线产生电致发光。这与纳米线核心与径向生长的n掺杂层之间界面处存在势垒有关,尽管这些纳米线形态相同,但该势垒对纳米线的电学性质有不同的影响。通过关联多扫描技术,即电子束诱导电流显微镜、电致发光映射和阴极发光分析,研究了势垒对纳米线阵列性能的影响。发现阵列中不均匀性的主要原因与注入有源区的电荷未优化有关,通过改变接触结构可以克服这一问题,使电子直接注入n掺杂底层。开发出了具有所谓“正面n接触”的LED,使发光纳米线的产率从20%提高到了65%。

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