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原始石墨烯、氮/硼掺杂石墨烯和缺陷石墨烯上的等双轴应变氧吸附

Equibiaxial Strained Oxygen Adsorption on Pristine Graphene, Nitrogen/Boron Doped Graphene, and Defected Graphene.

作者信息

Qu Li-Hua, Fu Xiao-Long, Zhong Chong-Gui, Zhou Peng-Xia, Zhang Jian-Min

机构信息

School of Science, Nantong University, Nantong 226019, China.

Xi'an Modern Chemistry Research Institute, Xi'an 710065, China.

出版信息

Materials (Basel). 2020 Nov 4;13(21):4945. doi: 10.3390/ma13214945.

DOI:10.3390/ma13214945
PMID:33158010
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC7684466/
Abstract

We report first-principles calculations on the structural, mechanical, and electronic properties of O molecule adsorption on different graphenes (including pristine graphene (G-O), N(nitrogen)/B(boron)-doped graphene (G-N/B-O), and defective graphene (G-D-O)) under equibiaxial strain. Our calculation results reveal that G-D-O possesses the highest binding energy, indicating that it owns the highest stability. Moreover, the stabilities of the four structures are enhanced enormously by the compressive strain larger than 2%. In addition, the band gaps of G-O and G-D-O exhibit direct and indirect transitions. Our work aims to control the graphene-based structure and electronic properties via strain engineering, which will provide implications for the application of new elastic semiconductor devices.

摘要

我们报告了在等双轴应变下,氧分子吸附在不同石墨烯(包括原始石墨烯(G-O)、氮(N)/硼(B)掺杂石墨烯(G-N/B-O)和缺陷石墨烯(G-D-O))上的结构、力学和电子性质的第一性原理计算。我们的计算结果表明,G-D-O具有最高的结合能,这表明它具有最高的稳定性。此外,当压缩应变大于2%时,这四种结构的稳定性会大幅增强。另外,G-O和G-D-O的带隙呈现直接和间接跃迁。我们的工作旨在通过应变工程来控制基于石墨烯的结构和电子性质,这将为新型弹性半导体器件的应用提供启示。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/bf9c/7684466/08c880fcdf54/materials-13-04945-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/bf9c/7684466/f81a03ccb534/materials-13-04945-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/bf9c/7684466/9674520528fb/materials-13-04945-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/bf9c/7684466/4b1908613e08/materials-13-04945-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/bf9c/7684466/8706983033c0/materials-13-04945-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/bf9c/7684466/08c880fcdf54/materials-13-04945-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/bf9c/7684466/f81a03ccb534/materials-13-04945-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/bf9c/7684466/9674520528fb/materials-13-04945-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/bf9c/7684466/4b1908613e08/materials-13-04945-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/bf9c/7684466/8706983033c0/materials-13-04945-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/bf9c/7684466/08c880fcdf54/materials-13-04945-g005.jpg

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