Nicoloiu Alexandra, Stan George E, Nastase Claudia, Boldeiu George, Besleaga Cristina, Dinescu Adrian, Muller Alexandru
IEEE Trans Ultrason Ferroelectr Freq Control. 2021 May;68(5):1938-1948. doi: 10.1109/TUFFC.2020.3037789. Epub 2021 Apr 26.
Thin AlN piezoelectric layers have been deposited on high resistivity Si and glass substrates by reactive RF magnetron sputtering, in order to manufacture one-port gigahertz operating surface acoustic wave (SAW)-type resonators to be used as temperature sensors. The growth morphology surface topography, crystallographic structure, and crystalline quality of the AlN layers have been analyzed. Advanced nanolithographic techniques have been used to manufacture structures having interdigitated transducers with fingers and finger interdigit spacing width in the range of 250-170 nm. High resonance frequency ensures the increase of the sensitivity, but also of its normalized value, the temperature coefficient of frequency (TCF). The resonance frequency shift versus temperature has been measured in the -267°C-+150°C temperature range, using a cryostat setup adapted for on wafer microwave measurements up to 50 GHz. The sensitivity and the TCF were determined in the 25 °C-150 °C temperature range.
通过反应射频磁控溅射在高电阻率硅和玻璃衬底上沉积了薄氮化铝(AlN)压电层,以制造用作温度传感器的单端口千兆赫兹工作表面声波(SAW)型谐振器。分析了AlN层的生长形态、表面形貌、晶体结构和晶体质量。采用先进的纳米光刻技术制造了具有叉指换能器的结构,其指条和指条叉指间距宽度在250 - 170 nm范围内。高谐振频率不仅确保了灵敏度的提高,还提高了其归一化值,即频率温度系数(TCF)。使用适用于高达50 GHz的晶圆上微波测量的低温恒温器装置,在-267°C至+150°C温度范围内测量了谐振频率随温度的变化。在25°C至150°C温度范围内确定了灵敏度和TCF。