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用于单片硅光子学平台上超紧凑波导交叉的光束整形

Beam shaping for ultra-compact waveguide crossings on monolithic silicon photonics platform.

作者信息

Chandran Sujith, Dahlem Marcus, Bian Yusheng, Moreira Paulo, Jacob Ajey P, Rakowski Michal, Stricker Andy, Nummy Karen, Meagher Colleen, Peng Bo, Thomas Abu, Hu Shuren, Petykiewicz Jan, Sowinski Zoey, Lee Won Suk, Augur Rod, Riggs Dave, Letavic Ted, Yu Anthony, Giewont Ken, Pellerin John, Viegas Jaime

出版信息

Opt Lett. 2020 Nov 15;45(22):6230-6233. doi: 10.1364/OL.402446.

DOI:10.1364/OL.402446
PMID:33186957
Abstract

A beam shaping approach has been implemented to realize high-performance waveguide crossings based on cosine tapers. Devices with a compact footprint of 4.7µ×4.7µ were fabricated on the GLOBALFOUNDRIES 45 nm monolithic silicon photonics platform (45 CLO technology). Fabricated devices are found to be nearly wavelength independent (±0.035 for 1260≤≤1360) with low insertion loss (∼0.2) and crosstalk (-35). The measured response of the devices is consistent with the three-dimensional finite-difference time-domain simulation results. The design stability is validated by measuring the device insertion loss on eight chips, which is found to be 0.197±0.017 at the designed center wavelength of 1310 nm.

摘要

已经实施了一种光束整形方法,以基于余弦锥度实现高性能波导交叉。在格罗方德45纳米单片硅光子平台(45CLO技术)上制造了占地面积仅为4.7µ×4.7µ的器件。发现制造的器件几乎与波长无关(对于1260≤λ≤1360,±0.035),具有低插入损耗(约0.2)和串扰(-35)。器件的测量响应与三维时域有限差分模拟结果一致。通过测量八个芯片上器件的插入损耗来验证设计稳定性,发现在设计中心波长1310纳米处为0.197±0.017。

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