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UV 抗性基因座 8 以乙烯依赖的方式介导紫外 B 诱导的气孔关闭。

UV RESISTANCE LOCUS8 mediates ultraviolet-B-induced stomatal closure in an ethylene-dependent manner.

机构信息

School of Life Science, Shaanxi Normal University, Xi'an, 710119, China; State Key Laboratory of Crop Biology, College of Life Sciences, Shandong Agricultural University, Tai'an, 271018, China.

School of Life Science, Shaanxi Normal University, Xi'an, 710119, China.

出版信息

Plant Sci. 2020 Dec;301:110679. doi: 10.1016/j.plantsci.2020.110679. Epub 2020 Sep 18.

DOI:10.1016/j.plantsci.2020.110679
PMID:33218642
Abstract

Although the UV RESISTANCE LOCUS 8 (UVR8)-CONSTITUTIVELY PHOTOMORPHOGENIC1 (COP1)-ELONGATED HYPOCOTYL5 (HY5) signaling pathway, ethylene, hydrogen peroxide (HO), and nitric oxide (NO) all participate in ultraviolet-B (UV-B)-triggered stomatal closing, their interrelationship is not clear. Here, we found that UV-B-induced the expression of ethylene biosynthetic genes, production of ethylene, HO, and NO, and stomata closing were impaired in uvr8, cop1, and hy5 mutants. UV-B-induced NO production and stomata closing were also defective in mutants for ETHYLENE RESPONSE 1 (ETR1), ETHYLENE INSENSITIVE 2 (EIN2), and EIN3, but UV-B-triggered HO generation was only inhibited in etr1. In either the absence or presence of UV-B, ethylene triggered HO production but not NO generation and stomatal closure in cop1 and hy5, and stomata closing in cop1 and hy5 was induced by NO but not HO. Moreover, NO production and stomatal closure were constitutively caused by over-expression of COP1 or HY5 in ein2 and ein3, but not by over-expression of EIN2 or EIN3 in cop1 and hy5. Our data indicate that the UVR8-COP1-HY5 signaling module mediates UV-B-induced ethylene production, ethylene is then perceived by ETR1 to induce HO synthesis. HO induces NO generation and subsequent stomata closing via an EIN2, EIN3, COP1, and HY5-dependent pathway(s).

摘要

虽然紫外线抵抗基因 8(UVR8)-组成性光形态建成 1(COP1)-伸长的下胚轴 5(HY5)信号通路、乙烯、过氧化氢(HO)和一氧化氮(NO)都参与了紫外-B(UV-B)引发的气孔关闭,但它们之间的关系尚不清楚。在这里,我们发现 UV-B 诱导了乙烯生物合成基因的表达、乙烯、HO 和 NO 的产生以及气孔关闭,在 uvr8、cop1 和 hy5 突变体中这些过程都受到了损害。UV-B 诱导的 NO 产生和气孔关闭在 ETR1、EIN2 和 EIN3 的突变体中也存在缺陷,但 UV-B 触发的 HO 生成仅在 etr1 中受到抑制。无论是在缺乏 UV-B 还是存在 UV-B 的情况下,乙烯都会在 cop1 和 hy5 中触发 HO 产生而不是 NO 产生和气孔关闭,并且在 cop1 和 hy5 中,气孔关闭是由 NO 而不是 HO 诱导的。此外,COP1 或 HY5 的过表达在 ein2 和 ein3 中会导致 NO 产生和气孔关闭,但在 cop1 和 hy5 中,EIN2 或 EIN3 的过表达不会导致这两种情况的发生。我们的数据表明,UVR8-COP1-HY5 信号模块介导了 UV-B 诱导的乙烯产生,然后乙烯被 ETR1 感知以诱导 HO 的合成。HO 通过 EIN2、EIN3、COP1 和 HY5 依赖的途径诱导 NO 产生和随后的气孔关闭。

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