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具有核壳结构的纳米线中 GaN/AlN 量子点的载流子复合研究。

Studies on Carrier Recombination in GaN/AlN Quantum Dots in Nanowires with a Core-Shell Structure.

作者信息

Deng Jun, Hao Zhibiao, Wang Lai, Yu Jiadong, Wang Jian, Sun Changzheng, Han Yanjun, Xiong Bing, Li Hongtao, Zhao Wei, Liang Xihui, Wang Junjun, Luo Yi

机构信息

Department of Electronic Engineering, Beijing National Research Center for Information Science and Technology, Tsinghua University, Beijing 100084, China.

Institute of Semiconductors, Guangdong Academy of Sciences, Guangzhou 510070, China.

出版信息

Nanomaterials (Basel). 2020 Nov 20;10(11):2299. doi: 10.3390/nano10112299.

Abstract

GaN quantum dots embedded in nanowires have attracted much attention due to their superior optical properties. However, due to the large surface-to-volume ratio of the nanowire, the impacts of surface states are the primary issue responsible for the degradation of internal quantum efficiency (IQE) in heterostructured dot-in-nanowires. In this paper, we investigate the carrier recombination mechanism of GaN/AlN dot-in-nanowires with an in situ grown AlN shell structure. Ultraviolet photoelectron spectroscopy (UPS) measurements were performed to describe the band bending effect on samples with different shell thicknesses. Temperature-dependent photoluminescence (TDPL) data support that increasing the AlN shell thickness is an efficient way to improve internal quantum efficiency. Detailed carrier dynamics was analyzed and combined with time-resolved photoluminescence (TRPL). The experimental data are consistent with our physical model that the AlN shell can effectively flatten the band bending near the surface and isolate the surface non-radiative recombination center. Our systematic research on GaN/AlN quantum dots in nanowires with a core-shell structure may significantly advance the development of a broad range of nanowire-based optoelectronic devices.

摘要

嵌入纳米线中的氮化镓量子点因其优异的光学性质而备受关注。然而,由于纳米线的表面积与体积之比很大,表面态的影响是导致异质结构纳米线中量子点内部量子效率(IQE)下降的主要问题。在本文中,我们研究了具有原位生长氮化铝壳结构的氮化镓/氮化铝纳米线中量子点的载流子复合机制。通过紫外光电子能谱(UPS)测量来描述不同壳层厚度样品上的能带弯曲效应。变温光致发光(TDPL)数据表明,增加氮化铝壳层厚度是提高内部量子效率的有效方法。结合时间分辨光致发光(TRPL)对详细的载流子动力学进行了分析。实验数据与我们的物理模型一致,即氮化铝壳层可以有效地使表面附近的能带弯曲变平,并隔离表面非辐射复合中心。我们对具有核壳结构的纳米线中的氮化镓/氮化铝量子点进行的系统研究可能会显著推动广泛的基于纳米线的光电器件的发展。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/6a0b/7699813/41ce3882e29e/nanomaterials-10-02299-g001.jpg

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