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在具有溅射 AlN 缓冲层的 ScAlMgO(0001)衬底上生长 GaInN/GaN 量子阱。

Growth of GaInN/GaN Quantum-Wells on a ScAlMgO (0001) Substrate with an - Sputtered-AlN Buffer Layer.

作者信息

Zheng Dong-Guang, Min Sangjin, Kim Jiwon, Han Dong-Pyo

机构信息

Department of Electronic and Communication, Hangzhou Dianzi University Information Engineering College, Hangzhou 311305, China.

Department of Photonics and Nanoelectronics, Hanyang University, Ansan 15588, Gyeonggi, Republic of Korea.

出版信息

Materials (Basel). 2023 Dec 28;17(1):167. doi: 10.3390/ma17010167.

Abstract

This study attempted to improve the internal quantum efficiency (IQE) of 580 nm emitting GaInN/GaN quantum-wells (QWs) through the replacement of a conventional -sapphire substrate and an low-temperature GaN (LT-GaN) buffer layer with the ScAlMgO (0001) (SCAM) substrate and an sputtered-AlN (sp-AlN) buffer layer, simultaneously. To this end, we initially tried to optimize the thickness of the sp-AlN buffer layer by investigating the properties/qualities of an undoped-GaN (u-GaN) template layer grown on the SCAM substrate with the sp-AlN buffer layer in terms of surface morphology, crystallographic orientation, and dislocation type/density. The experimental results showed that the crystallinity of the u-GaN layer grown on the SCAM substrate with the 30 nm thick sp-AlN buffer layer [GaN/sp-AlN(30 nm)/SCAM] was superior to that of the conventional u-GaN template layer grown on the -sapphire substrate with an LT-GaN buffer layer (GaN/LT-GaN/FSS). Notably, the experimental results showed that the structural properties and crystallinity of GaN/sp-AlN(30 nm)/SCAM were considerably different from those of GaN/LT-GaN/FSS. Specifically, the edge-type dislocation density was approximately two orders of magnitude higher than the screw-/mixed-type dislocation density, i.e., the generation of screw-/mixed-type dislocation was suppressed through the replacement, unlike that of the GaN/LT-GaN/FSS. Next, to investigate the effect of replacement on the subsequent QW active layers, 580 nm emitting GaInN/GaN QWs were grown on the u-GaN template layers. The IQEs of the samples were measured by means of temperature-dependent photoluminescence efficiency, and the results showed that the replacement improved the IQE at 300 K by approximately 1.8 times. We believe that the samples fabricated and described in the present study can provide a greater insight into future research directions for III-nitride light-emitting devices operating in yellow-red spectral regions.

摘要

本研究试图通过同时用ScAlMgO(0001)(SCAM)衬底和溅射AlN(sp-AlN)缓冲层替代传统的蓝宝石衬底和低温GaN(LT-GaN)缓冲层,来提高发射波长为580nm的GaInN/GaN量子阱(QW)的内量子效率(IQE)。为此,我们首先通过研究在具有sp-AlN缓冲层的SCAM衬底上生长的未掺杂GaN(u-GaN)模板层的表面形貌、晶体取向以及位错类型/密度等特性/质量,来优化sp-AlN缓冲层的厚度。实验结果表明,在具有30nm厚sp-AlN缓冲层[GaN/sp-AlN(30nm)/SCAM]的SCAM衬底上生长的u-GaN层的结晶度优于在具有LT-GaN缓冲层的蓝宝石衬底上生长的传统u-GaN模板层(GaN/LT-GaN/FSS)。值得注意的是,实验结果表明GaN/sp-AlN(30nm)/SCAM的结构特性和结晶度与GaN/LT-GaN/FSS有很大不同。具体而言,边缘型位错密度比螺旋/混合型位错密度高约两个数量级,即通过这种替代抑制了螺旋/混合型位错的产生,这与GaN/LT-GaN/FSS不同。接下来,为了研究这种替代对后续QW有源层的影响,在u-GaN模板层上生长了发射波长为580nm的GaInN/GaN QW。通过温度相关的光致发光效率测量了样品的IQE,结果表明这种替代使300K时的IQE提高了约1.8倍。我们认为,本研究中制备和描述的样品能够为未来在黄红色光谱区域工作的III族氮化物发光器件的研究方向提供更深入的见解。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/404f/10779881/04bca34f26c5/materials-17-00167-g001.jpg

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