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铝在深共晶介质和酸性电解液中的电化学抛光比较。

Comparison of Electropolishing of Aluminum in a Deep Eutectic Medium and Acidic Electrolyte.

机构信息

Applied Research Center at Thomas Jefferson National Accelerator Facility and Department of Molecular Biology and Chemistry at Christopher Newport University, Newport News, VA 23606, USA.

Department of Physical Sciences, Virginia Institute of Marine Science, College of William & Mary, Williamsburg, VA 23187, USA.

出版信息

Molecules. 2020 Dec 3;25(23):5712. doi: 10.3390/molecules25235712.

DOI:10.3390/molecules25235712
PMID:33287431
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC7730155/
Abstract

Research advances in electropolishing, with respect to the field of metalworking, have afforded significant improvements in the surface roughness and conductivity properties of aluminum polished surfaces in ways that machine polishing and simple chemical polishing cannot. The effects of a deep eutectic medium as an acid-free electrolyte were tested to determine the potential energy thresholds during electropolishing treatments based upon temperature, experiment duration, current, and voltage. Using voltammetry and chronoamperometry tests during electropolishing to supplement representative recordings via atomic force microscopy (AFM), surface morphology comparisons were performed regarding the electropolishing efficiency of phosphoric acid and acid-free ionic liquid treatments for aluminum. This eco-friendly solution produced polished surfaces superior to those surfaces treated with industry standard acid electrochemistry treatments of 1 M phosphoric acid. The roughness average of the as-received sample became 6.11 times smoother, improving from 159 nm to 26 nm when electropolished with the deep eutectic solvent. This result was accompanied by a mass loss of 0.039 g and a 7.2 µm change in step height along the edge of the electropolishing interface, whereas the acid treatment resulted in a slight improvement in surface roughness, becoming 1.63 times smoother with an average post-electropolishing roughness of 97.7 nm, yielding a mass loss of 0.0458 g and a step height of 8.1 µm.

摘要

关于金属加工领域的电解抛光研究进展,在改善铝抛光表面的粗糙度和导电性方面取得了显著的进展,这是机械抛光和简单化学抛光所无法实现的。测试了深共晶介质作为无酸电解液的效果,以确定基于温度、实验持续时间、电流和电压的电解抛光处理的潜在能量阈值。通过在电解抛光过程中使用伏安法和计时电流法测试,结合原子力显微镜(AFM)的代表性记录,对磷酸和无酸离子液体处理铝的电解抛光效率进行了表面形貌比较。与 1 M 磷酸的工业标准酸电化学处理相比,这种环保解决方案产生的抛光表面优于经处理的表面。原始样品的粗糙度平均值变得平滑了 6.11 倍,从 159nm 提高到 26nm,而用深共晶溶剂进行电解抛光。这一结果伴随着质量损失 0.039g 和沿电解抛光界面边缘的台阶高度变化 7.2µm,而酸处理导致表面粗糙度略有改善,平均后电解抛光粗糙度为 97.7nm,平滑度提高 1.63 倍,质量损失 0.0458g,台阶高度 8.1µm。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/bd7e/7730155/d8f7277854b2/molecules-25-05712-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/bd7e/7730155/e9953807881c/molecules-25-05712-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/bd7e/7730155/61272991825d/molecules-25-05712-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/bd7e/7730155/52053a2866e5/molecules-25-05712-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/bd7e/7730155/d8f7277854b2/molecules-25-05712-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/bd7e/7730155/e9953807881c/molecules-25-05712-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/bd7e/7730155/61272991825d/molecules-25-05712-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/bd7e/7730155/52053a2866e5/molecules-25-05712-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/bd7e/7730155/d8f7277854b2/molecules-25-05712-g004.jpg

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