Amâncio Moíses Amaral, Pinto Erveton Pinheiro, Matos Robert Saraiva, Nobre Francisco Xavier, Brito Walter Ricardo, da Fonseca Filho Henrique Duarte
Department of Chemistry, Federal University of Amazonas, Manaus, Amazonas, Brazil.
Department of Physics, Federal University of Amapá, Macapá, Amapá, Brazil.
J Microsc. 2021 May;282(2):162-174. doi: 10.1111/jmi.12990. Epub 2021 Jan 16.
In this paper, we introduced an advanced discussion of the 3D morphology of TiO coatings deposited on ITO substrate by electrodeposition under different deposition times. Atomic force microscopy was applied for obtaining topographic images of the samples. The images were processed using the MountainsMap 8.0 commercial software according to ISO 25178-2:2012. Moreover, fractal theory was applied to study the surface microtexture of coatings. The morphology was affected by the deposition time, where the grain size decreased with the increase of the time, making film's surfaces smoother. In addition, the surface roughness exhibited a random behaviour, but does not presented significant difference between samples. The fractal dimension showed similar values for all coatings. In contrast, surface texture isotropy also exhibited random behaviour. However, advanced fractal parameters revealed that when the deposition time increased, the coatings microtexture has become uniform and less porous. Furthermore, all coatings presented high topographic uniformity, regardless of deposition time. These results revealed that the morphology and microtexture of TiO -based coatings can be controlled by the deposition time. LAY DESCRIPTION: An advanced characterization on the micromorphology of 3D morphology, using AFM images, of Titanium dioxide (TiO ) coatings deposited on ITO substrate by electrodeposition under different deposition times. TiO is one of the most studied semiconductors to make photovoltaic devices. The versatility of this semiconductor is associated with low toxicity, high photochemical stability, abundance, and the facility to obtain by conventional synthesis routes. The obtention of a homogeneous and stable layer in the semiconductor TiO film deposition is a crucial stage in the assembly of sensitized photovoltaic devices. Atomic Force Microscopy (AFM) is a technique which can magnify up to a billion times and it uses a tip or probe which touches the sample surface point by point. The tip deflection is interpreted as the surface topography by the software, producing 2D or 3D images that generate several tribological parameters such as roughness in respect to a scanned area, has been a technique widely reported in the morphological characterization, determination of thickness, roughness, and particle size in thin films. Therefore, in this paper, the morphology was studied by atomic force microscopy using MountainsMap commercial software. The main goal was to study the influence of the deposition time on the morphology and microtexture of the material. New parameters such as surface entropy, fractal succolarity and fractal lacunarity were obtained for studying coatings microtexture's complexity.
在本文中,我们深入探讨了在不同沉积时间下通过电沉积法在ITO衬底上沉积的TiO涂层的三维形态。应用原子力显微镜获取样品的形貌图像。根据ISO 25178-2:2012标准,使用MountainsMap 8.0商业软件对图像进行处理。此外,应用分形理论研究涂层的表面微观纹理。形态受沉积时间的影响,随着时间的增加晶粒尺寸减小,使薄膜表面更光滑。此外,表面粗糙度表现出随机行为,但样品之间没有显著差异。所有涂层的分形维数显示出相似的值。相比之下,表面纹理各向同性也表现出随机行为。然而,先进的分形参数表明,当沉积时间增加时,涂层的微观纹理变得更加均匀且孔隙率更低。此外,无论沉积时间如何,所有涂层都呈现出高度的形貌均匀性。这些结果表明,基于TiO的涂层的形态和微观纹理可以通过沉积时间来控制。层描述:使用原子力显微镜图像对在不同沉积时间下通过电沉积法在ITO衬底上沉积的二氧化钛(TiO)涂层的三维形态微观形貌进行先进表征。TiO是用于制造光电器件研究最多的半导体之一。这种半导体的多功能性与低毒性、高光化学稳定性、丰富性以及通过传统合成路线获得的便利性有关。在半导体TiO薄膜沉积中获得均匀且稳定的层是敏化光电器件组装中的关键阶段。原子力显微镜(AFM)是一种可以放大高达十亿倍的技术,它使用一个尖端或探针逐点接触样品表面。尖端的偏转由软件解释为表面形貌,生成二维或三维图像,这些图像会生成几个摩擦学参数,如相对于扫描区域的粗糙度,这是一种在薄膜的形态表征、厚度测定、粗糙度和颗粒尺寸测定中广泛报道的技术。因此,在本文中,使用MountainsMap商业软件通过原子力显微镜研究形态。主要目标是研究沉积时间对材料形态和微观纹理的影响。获得了诸如表面熵、分形紧密度和分形孔隙率等新参数,用于研究涂层微观纹理的复杂性。