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二维范德华磁隧道结中自旋过滤诱导的大磁电阻

Spin-filter induced large magnetoresistance in 2D van der Waals magnetic tunnel junctions.

作者信息

Yang Wei, Cao Yuan, Han Jiangchao, Lin Xiaoyang, Wang Xinhe, Wei Guodong, Lv Chen, Bournel Arnaud, Zhao Weisheng

机构信息

Fert Beijing Research Institute, MIIT Key Laboratory of Spintronics, School of Integrated Circuit Science and Engineering & Beijing Advanced Innovation Center for Big Data and Brain Computing, Beihang University, Beijing 100191, China.

出版信息

Nanoscale. 2021 Jan 14;13(2):862-868. doi: 10.1039/d0nr07290g. Epub 2020 Dec 23.

DOI:10.1039/d0nr07290g
PMID:33355579
Abstract

Two-dimensional (2D) van der Waals (vdW) heterostructures, known as layer-by-layer stacked 2D materials in a precisely chosen sequence, have received more and more attention in spintronics for their ultra-clean interface, unique electronic properties and 2D ferromagnetism. Motivated by the recent synthesis of monolayer 1T-VSe2 with ferromagnetic ordering and a high Curie temperature above room temperature, we investigate the bias-voltage driven spin transport properties of 2D magnetic tunnel junctions (MTJs) based on VSe2 utilizing density functional theory combined with the nonequilibrium Green's function method. In the device 1T-MoSe2/1T-VSe2/2H-WSe2/1T-VSe2/1T-MoSe2, the tunneling magneto-resistance (TMR) is incredibly satisfactory up to 5600%. Based on the analysis of evanescent states, this large TMR is attributed to the spin filter effect at the interface between 1T-VSe2 and 2H-WSe2, which overcomes the low spin polarization of 1T-VSe2. Furthermore, by inserting 2H-MoSe2, the spin filter effect is enhanced with decreasing current and the TMR is drastically improved to 1.7 × 10%. This work highlights the feasibility of 2D vdW heterostructures for ultra-low power spintronic applications by electronic structural engineering.

摘要

二维(2D)范德华(vdW)异质结构,即按精确选择的顺序逐层堆叠的二维材料,因其超清洁界面、独特的电子特性和二维铁磁性,在自旋电子学中受到越来越多的关注。受近期具有铁磁有序且居里温度高于室温的单层1T-VSe2合成的启发,我们利用密度泛函理论结合非平衡格林函数方法,研究了基于VSe2的二维磁性隧道结(MTJ)的偏置电压驱动自旋输运特性。在器件1T-MoSe2/1T-VSe2/2H-WSe2/1T-VSe2/1T-MoSe2中,隧穿磁电阻(TMR)高达5600%,令人非常满意。基于对倏逝态的分析,这种大的TMR归因于1T-VSe2和2H-WSe2界面处的自旋过滤效应,该效应克服了1T-VSe2的低自旋极化。此外通过插入2H-MoSe2,随着电流减小,自旋过滤效应增强,TMR大幅提高到1.7×10%。这项工作突出了通过电子结构工程实现二维vdW异质结构用于超低功耗自旋电子学应用的可行性。

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