Diak Ethan, Mazloumi Mahyar, Sabat Ribal Georges
Opt Express. 2020 Dec 21;28(26):39629-39639. doi: 10.1364/OE.414215.
Plasmonic crossed surface relief gratings were fabricated using interference lithography. Their topographies were studied by AFM as a function of laser exposure time and their surface plasmon resonance at a gold-air interface was measured between crossed polarizers in transmission and in reflection modes. Both modes resulted in emitted plasmonic light at specific wavelengths related to the grating pitch, with the reflectance SPR having a much higher intensity than the transmittance SPR. The use of these gratings as plasmonic sensors was examined and their sensitivities were measured in the reflectance and transmittance modes to be 601 nm/RIU and 589 nm/RIU, respectively.
采用干涉光刻技术制备了等离子体交叉表面浮雕光栅。通过原子力显微镜研究了它们的形貌与激光曝光时间的关系，并在交叉偏振器之间以透射和反射模式测量了金-空气界面处的表面等离子体共振。两种模式都在与光栅间距相关的特定波长处产生了发射的等离子体光，反射SPR的强度远高于透射SPR。研究了这些光栅作为等离子体传感器的用途，并在反射和透射模式下测量了它们的灵敏度，分别为601 nm/RIU和589 nm/RIU。
