Zhao Lihuan, Shang Haiping, Wang Dahai, Liu Yang, Tian Baohua, Wang Weibing
Institute of Microelectronics of the Chinese Academy of Science, Beijing 100029, China.
Kunshan Branch, Institute of Microelectronics of Chinese Academy of Sciences, Suzhou 215347, China.
Materials (Basel). 2020 Dec 30;14(1):128. doi: 10.3390/ma14010128.
High hardness and corrosion resistance of SiC (silicon carbide) bulk materials have always been a difficult problem in the processing of an all-SiC piezoresistive pressure sensor. In this work, we demonstrated a SiC sealing cavity structure utilizing SiC shallow plasma-etched process (≤20 μm) and SiC-SiC room temperature bonding technology. The SiC bonding interface was closely connected, and its average tensile strength could reach 6.71 MPa. In addition, through a rapid thermal annealing (RTA) experiment of 1 min and 10 mins in N atmosphere of 1000 °C, it was found that Si, C and O elements at the bonding interface were diffused, while the width of the intermediate interface layer was narrowed, and the tensile strength could remain stable. This SiC sealing cavity structure has important application value in the realization of an all-SiC piezoresistive pressure sensor.
碳化硅(SiC)块状材料的高硬度和耐腐蚀性一直是全碳化硅压阻式压力传感器加工过程中的难题。在这项工作中,我们展示了一种利用SiC浅等离子体蚀刻工艺(≤20μm)和SiC-SiC室温键合技术的SiC密封腔结构。SiC键合界面紧密相连,其平均拉伸强度可达6.71MPa。此外,通过在1000℃的N气氛中进行1分钟和10分钟的快速热退火(RTA)实验,发现键合界面处的Si、C和O元素发生了扩散,而中间界面层的宽度变窄,拉伸强度可以保持稳定。这种SiC密封腔结构在全碳化硅压阻式压力传感器的实现中具有重要的应用价值。