Wejrzanowski Tomasz, Tymicki Emil, Plocinski Tomasz, Bucki Janusz Józef, Tan Teck Leong
Faculty of Materials Science and Engineering, Warsaw University of Technology, Woloska 141, 02 507 Warsaw, Poland.
Łukasiewicz Research Network-Institute of Microelectronics and Photonics, Al. Lotników 32/46, 02-668 Warsaw, Poland.
Sensors (Basel). 2021 Sep 10;21(18):6066. doi: 10.3390/s21186066.
Within these studies the piezoresistive effect was analyzed for 6H-SiC and 4H-SiC material doped with various elements: N, B, and Sc. Bulk SiC crystals with a specific concentration of dopants were fabricated by the Physical Vapor Transport (PVT) technique. For such materials, the structures and properties were analyzed using X-ray diffraction, SEM, and Hall measurements. The samples in the form of a beam were also prepared and strained (bent) to measure the resistance change (Gauge Factor). Based on the results obtained for bulk materials, piezoresistive thin films on 6H-SiC and 4H-SiC substrate were fabricated by Chemical Vapor Deposition (CVD). Such materials were shaped by Focus Ion Beam (FIB) into pressure sensors with a specific geometry. The characteristics of the sensors made from different materials under a range of pressures and temperatures were obtained and are presented herewith.
在这些研究中,对掺杂了各种元素(氮、硼和钪)的6H-SiC和4H-SiC材料的压阻效应进行了分析。通过物理气相传输(PVT)技术制备了具有特定掺杂剂浓度的块状SiC晶体。对于此类材料,使用X射线衍射、扫描电子显微镜(SEM)和霍尔测量对其结构和性能进行了分析。还制备了梁状样品并使其应变(弯曲)以测量电阻变化(应变系数)。基于块状材料获得的结果,通过化学气相沉积(CVD)在6H-SiC和4H-SiC衬底上制备了压阻薄膜。此类材料通过聚焦离子束(FIB)加工成具有特定几何形状的压力传感器。获得了由不同材料制成的传感器在一系列压力和温度下的特性,并在此呈现。