通过常压等离子体增强化学气相沉积法制备TiO涂层以提高透明塑料的抗紫外线性能

Xu Jing, Nagasawa Hiroki, Kanezashi Masakoto, Tsuru Toshinori

Department of Chemical Engineering, Hiroshima University, Higashi-Hiroshima, Hiroshima 739-8527, Japan.

ACS Omega. 2021 Jan 6;6(2):1370-1377. doi: 10.1021/acsomega.0c04999. eCollection 2021 Jan 19.

Herein, TiO coatings were deposited on photodegradable polymers for protection from UV irradiation using the atmospheric-pressure plasma-enhanced chemical vapor deposition (AP-PECVD) technique. Polymethylmethacrylate (PMMA) and polycarbonate (PC) substrates were coated with titanium tetraisopropoxide as the precursor in an open-air atmospheric-pressure nonequilibrium argon plasma jet. The AP-PECVD-derived TiO coatings exhibited good adhesion to PMMA and PC. The TiO coatings could shield more than 99% of UV light in the wavelength range of 200-300 nm, without affecting the transmittance of visible light. UV irradiation tests on polymer films demonstrated that the degradation rates of PMMA and PC were significantly reduced by one-tenth after they were coated with TiO films.

在此，采用常压等离子体增强化学气相沉积（AP - PECVD）技术，在可光降解聚合物上沉积TiO涂层，以保护其免受紫外线照射。在露天常压非平衡氩等离子体射流中，以四异丙醇钛为前驱体，对聚甲基丙烯酸甲酯（PMMA）和聚碳酸酯（PC）基板进行涂层处理。由AP - PECVD制备的TiO涂层对PMMA和PC表现出良好的附着力。该TiO涂层能够屏蔽200 - 300 nm波长范围内超过99%的紫外线，且不影响可见光的透过率。对聚合物薄膜进行的紫外线照射测试表明，PMMA和PC在涂覆TiO薄膜后，降解速率显著降低至原来的十分之一。