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抗生素耐药基因在氯、臭氧和紫外线水处理过程中的降解动力学:耐甲氧西林金黄色葡萄球菌(MRSA)。

Degradation Kinetics of Antibiotic Resistance Gene of Methicillin-Resistant (MRSA) during Water Disinfection with Chlorine, Ozone, and Ultraviolet Light.

机构信息

School of Earth Sciences and Environmental Engineering, Gwangju Institute of Science and Technology (GIST), Gwangju, 61005, Republic of Korea.

Department of Civil and Environmental Engineering, University of Washington (UW), Seattle, Washington 98195-2700, United States.

出版信息

Environ Sci Technol. 2021 Feb 16;55(4):2541-2552. doi: 10.1021/acs.est.0c05274. Epub 2021 Jan 26.

DOI:10.1021/acs.est.0c05274
PMID:33499587
Abstract

Degradation kinetics of antibiotic resistance genes (ARGs) by free available chlorine (FAC), ozone (O), and UV light (UV) were investigated in phosphate buffered solutions at pH 7 using a chromosomal ARG () of methicillin-resistant (MRSA). For FAC, the degradation rates of extracellular (extra-) were accelerated with increasing FAC exposure, which could be explained by a two-step FAC reaction model. The degradation of extra- by O followed second-order reaction kinetics. The degradation of extra- by UV exhibited tailing kinetics, which could be described by a newly proposed kinetic model considering cyclobutane pyrimidine dimer (CPD) formation, its photoreversal, and irreversible (6-4) photoproduct formation. Measured rate constants for extra- increased linearly with amplicon length for FAC and O, or with number of intrastrand pyrimidine doublets for UV, which enabled prediction of degradation rate constants of extra- amplicons based on sequence length and/or composition. In comparison to those of extra-, the observed degradation rates of intracellular (intra-) were faster for FAC and O at low oxidant exposures but significantly slower at high exposures for FAC and UV. Differences in observed extra- and intracellular kinetics could be due to decreased DNA recovery efficiency and/or the presence of MRSA aggregates protected from disinfectants.

摘要

在 pH 值为 7 的磷酸盐缓冲溶液中,使用耐甲氧西林金黄色葡萄球菌(MRSA)的染色体抗生素耐药基因(ARG),研究了游离有效氯(FAC)、臭氧(O)和紫外线(UV)对 ARG 的降解动力学。对于 FAC,随着 FAC 暴露量的增加,细胞外 (extra-)的降解速率加快,这可以用两步 FAC 反应模型来解释。O 对 extra-的降解遵循二级反应动力学。UV 对 extra-的降解表现出拖尾动力学,可以通过考虑环丁烷嘧啶二聚体(CPD)形成、光恢复及其不可逆(6-4)光产物形成的新提出的动力学模型来描述。对于 FAC 和 O,extra-的实测速率常数随扩增子长度线性增加,或者对于 UV,随链内嘧啶二联体的数量增加,这使得可以根据序列长度和/或组成预测 extra-扩增子的降解速率常数。与 extra-相比,在低氧化剂暴露下,FAC 和 O 对细胞内 (intra-)的观察到的降解速率更快,但在 FAC 和 UV 的高暴露下,降解速率显著更慢。观察到的 extra-和细胞内动力学之间的差异可能是由于 DNA 回收效率降低和/或存在免受消毒剂保护的 MRSA 聚集物。

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