Stelzer Bastian, Pingen Katrin, Hans Marcus, Holzapfel Damian M, Richter Silvia, Mayer Joachim, Pradeep Konda Gokuldoss, Schneider Jochen M
Materials Chemistry, RWTH Aachen University, 52074 Aachen, Germany.
Central Facility for Electron Microscopy, RWTH Aachen University, 52074 Aachen, Germany.
Materials (Basel). 2021 Feb 2;14(3):692. doi: 10.3390/ma14030692.
YTaZrO coatings with 0 to 44 mol% ZrO were synthesized by sputtering. Phase-pure -YTaO coatings were obtained at a substrate temperature of 900 °C. Alloying with ZrO resulted in the growth of along with -Zr(Y,Ta)O for ≤15 mol%, while for ≥28 mol%, ZrO X-ray diffraction (XRD) phase-pure metastable was formed, which may be caused by small grain sizes and/or kinetic limitations. The former phase region transformed into and and the latter to an and phase region upon annealing to 1300 and 1650 °C, respectively. In addition to and , -YTa(Zr)O phase fractions were observed at room temperature for ZrO contents ≥28 mol% after annealing to 1650 °C. phase fractions increased during in situ heating XRD at 80 °C. At 1650 °C, a reaction with the -AlO substrate resulted in the formation of AlTaO and an Al-Ta-Y-O compound.
通过溅射合成了ZrO含量为0至44摩尔%的YTaZrO涂层。在900℃的基板温度下获得了纯相的-YTaO涂层。当ZrO含量≤15摩尔%时，与ZrO合金化导致了-Zr(Y,Ta)O的生长，而当ZrO含量≥28摩尔%时，形成了ZrO X射线衍射（XRD）纯相亚稳相，这可能是由于晶粒尺寸小和/或动力学限制所致。在分别退火至1300℃和1650℃时，前一个相区转变为和相区，后一个相区转变为和相区。在退火至1650℃后，对于ZrO含量≥28摩尔%的情况，在室温下除了和相外，还观察到了-YTa(Zr)O相分数。在80℃的原位加热XRD过程中，相分数增加。在1650℃时，与-AlO基板发生反应，形成了AlTaO和一种Al-Ta-Y-O化合物。
