Chen Guanyu, Cheung Eric Jun Hao, Cao Yu, Pan Jisheng, Danner Aaron J
Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore, 117583, Singapore.
Institute of Materials Research and Engineering, A∗STAR (Agency for Science, Technology and Research), 2 Fusionopolis Way, Innovis #08-03, Singapore, 138634, Singapore.
Nanoscale Res Lett. 2021 Feb 10;16(1):32. doi: 10.1186/s11671-021-03494-2.
We analyzed the dry etching of perovskite oxides using argon-based inductively coupled plasmas (ICP) for photonics applications. Various chamber conditions and their effects on etching rates have been demonstrated based on Z-cut lithium niobate (LN). The measured results are predictable and repeatable and can be applied to other perovskite oxides, such as X-cut LN and barium titanium oxide (BTO). The surface roughness is better for both etched LN and BTO compared with their as-deposited counterparts as confirmed by atomic force microscopy (AFM). Both the energy-dispersive X-ray spectroscopy (EDS) and X-ray photoelectron spectroscopy (XPS) methods have been used for surface chemical component comparisons, qualitative and quantitative, and no obvious surface state changes are observed according to the measured results. An optical waveguide fabricated with the optimized argon-based ICP etching was measured to have -3.7 dB/cm loss near 1550 nm wavelength for Z-cut LN, which validates this kind of method for perovskite oxides etching in photonics applications.
我们分析了使用基于氩气的电感耦合等离子体（ICP）对钙钛矿氧化物进行干法蚀刻，以用于光子学应用。基于Z切铌酸锂（LN）展示了各种腔室条件及其对蚀刻速率的影响。测量结果具有可预测性和可重复性，并且可以应用于其他钙钛矿氧化物，如X切LN和钛酸钡（BTO）。通过原子力显微镜（AFM）证实，蚀刻后的LN和BTO的表面粗糙度均优于其沉积态对应物。能量色散X射线光谱（EDS）和X射线光电子能谱（XPS）方法均已用于表面化学成分的定性和定量比较，根据测量结果未观察到明显的表面状态变化。对于Z切LN，采用优化的基于氩气的ICP蚀刻制造的光波导在1550nm波长附近的损耗测量为-3.7dB/cm，这验证了这种用于光子学应用中钙钛矿氧化物蚀刻的方法。
