Elphick Kelvin, Yamaguchi Akinobu, Otsuki Akira, Hayagan Neil Lonio, Hirohata Atsufumi
Department of Electronic Engineering, University of York, Heslington, York YO10 5DD, UK.
Laboratory of Advance Science and Technology for Industry, University of Hyogo, Hyogo 678-1205, Japan.
Materials (Basel). 2021 Jan 29;14(3):613. doi: 10.3390/ma14030613.
Our recently developed non-destructive imaging technique was applied for the characterisation of nanoparticles synthesised by X-ray radiolysis and the sol-gel method. The interfacial conditions between the nanoparticles and the substrates were observed by subtracting images taken by scanning electron microscopy at controlled electron acceleration voltages to allow backscattered electrons to be generated predominantly below and above the interfaces. The interfacial adhesion was found to be dependent on the solution pH used for the particle synthesis or particle suspension preparation, proving the change in the particle formation/deposition processes with pH as anticipated and agreed with the prediction based on the Derjaguin-Landau-Verwey-Overbeek (DLVO) theory. We found that our imaging technique was useful for the characterisation of interfaces hidden by nanoparticles to reveal the formation/deposition mechanism and can be extended to the other types of interfaces.
我们最近开发的无损成像技术被应用于表征通过X射线辐射分解和溶胶-凝胶法合成的纳米颗粒。通过在可控电子加速电压下减去扫描电子显微镜拍摄的图像来观察纳米颗粒与基底之间的界面条件，以使背散射电子主要在界面下方和上方产生。发现界面粘附力取决于用于颗粒合成或颗粒悬浮液制备的溶液pH值，这证明了颗粒形成/沉积过程随pH值的变化正如预期的那样，并且与基于德亚金-朗道-韦弗-奥弗贝克（DLVO）理论的预测一致。我们发现我们的成像技术对于表征被纳米颗粒隐藏的界面以揭示形成/沉积机制很有用，并且可以扩展到其他类型的界面。
