Jeon Beomjoon, Lee Changhwan, Park Jeong Young
Department of Chemistry, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Republic of Korea.
Center for Nanomaterials and Chemical Reactions, Institute for Basic Science (IBS), Daejeon 34141, Republic of Korea.
ACS Appl Mater Interfaces. 2021 Feb 24;13(7):9252-9259. doi: 10.1021/acsami.0c22108. Epub 2021 Feb 15.
Hot electron flux, generated by both incident light energy and the heat of the catalytic reaction, is a major element for energy conversion at the surface. Controlling hot electron flux in a reversible manner is extremely important for achieving high energy conversion efficiency. Here we demonstrate that hot electron flux can be controlled by tuning the Schottky barrier height. This phenomenon was monitored by using a Schottky nanodiode composed of a metal-semiconductor. The formation of a Schottky barrier at a nanometer scale inevitably accompanies an intrinsic image potential between the metal-semiconductor junction, which lowers the effective Schottky barrier height. When a reverse bias is applied to the nanodiode, an additional image potential participates in a secondary barrier lowering, leading to the increased hot electron flow. Besides, a decrease of tunneling width results in facile electron transport through the barrier. The increased hot electron flux by the chemical reaction (chemicurrent) and by the photon absorption (photocurrent) indicates hot electrons are captured more effectively by modifying the Schottky barrier. This study can shed light on a quantitative understanding and application of charge behavior at metal-semiconductor interfaces, in solar energy conversion, or in a catalytic reaction.
由入射光能和催化反应热产生的热电子通量是表面能量转换的主要元素。以可逆方式控制热电子通量对于实现高能量转换效率极为重要。在此,我们证明了热电子通量可通过调节肖特基势垒高度来控制。这种现象通过使用由金属 - 半导体组成的肖特基纳米二极管进行监测。在纳米尺度形成肖特基势垒不可避免地伴随着金属 - 半导体结之间的固有镜像电势,这降低了有效肖特基势垒高度。当对纳米二极管施加反向偏压时,额外的镜像电势参与二次势垒降低,导致热电子流增加。此外,隧穿宽度的减小导致电子更容易通过势垒传输。通过化学反应(化学电流)和光子吸收(光电流)增加的热电子通量表明,通过修改肖特基势垒可以更有效地捕获热电子。这项研究有助于定量理解和应用金属 - 半导体界面、太阳能转换或催化反应中的电荷行为。