Tsuda Yasutaka, Gueriba Jessiel Siaron, Makino Takamasa, Diño Wilson Agerico, Yoshigoe Akitaka, Okada Michio
Department of Chemistry, Osaka University, Toyonaka, Osaka, 560-0043, Japan.
Materials Sciences Research Center, Japan Atomic Energy Agency, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo, 679-5148, Japan.
Sci Rep. 2021 Feb 15;11(1):3906. doi: 10.1038/s41598-021-82180-w.
We bombarded [Formula: see text] and [Formula: see text] with a 2.3 eV hyperthermal oxygen molecular beam (HOMB) source, and characterized the corresponding (oxide) surfaces with synchrotron-radiation X-ray photoemission spectroscopy (SR-XPS). At [Formula: see text], CuO forms on both [Formula: see text] and [Formula: see text]. When we increase the surface temperature to [Formula: see text], [Formula: see text] also forms on [Formula: see text], but not on [Formula: see text]. For comparison, [Formula: see text] forms even at [Formula: see text] on Cu(111). On [Formula: see text], [Formula: see text] forms only after [Formula: see text], and no oxides can be found at [Formula: see text]. We ascribe this difference in Cu oxide formation to the mobility of the interfacial species (Cu/Pd/Pt) and charge transfer between the surface Cu oxides and subsurface species (Cu/Pd/Pt).
我们用能量为2.3电子伏特的超热氧分子束(HOMB)源轰击[化学式:见原文]和[化学式:见原文],并用同步辐射X射线光电子能谱(SR-XPS)对相应的(氧化物)表面进行表征。在[化学式:见原文]时,[化学式:见原文]和[化学式:见原文]上均形成CuO。当我们将表面温度升高到[化学式:见原文]时,[化学式:见原文]上也会形成[化学式:见原文],但[化学式:见原文]上不会形成。作为对比,在Cu(111)上,即使在[化学式:见原文]时也会形成[化学式:见原文]。在[化学式:见原文]上,[化学式:见原文]仅在[化学式:见原文]之后形成,在[化学式:见原文]时未发现氧化物。我们将这种氧化铜形成的差异归因于界面物种(Cu/Pd/Pt)的迁移率以及表面氧化铜与次表面物种(Cu/Pd/Pt)之间的电荷转移。