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InAlAs/InGaAs量子阱结构中光学局域态与电学深能级态之间的相关性

Correlation between Optical Localization-State and Electrical Deep-Level State in InAlAs/InGaAs Quantum Well Structure.

作者信息

Ahn Il-Ho, Kim Deuk Young, Lee Sejoon

机构信息

Quantum-functional Semiconductor Research Center, Dongguk University-Seoul, Seoul 04620, Korea.

Division of Physics & Semiconductor Science, Dongguk University-Seoul, Seoul 04620, Korea.

出版信息

Nanomaterials (Basel). 2021 Feb 26;11(3):585. doi: 10.3390/nano11030585.

Abstract

The peculiar correlationship between the optical localization-state and the electrical deep-level defect-state was observed in the InAlAs/InGaAs quantum well structure that comprises two quantum-confined electron-states and two hole-subbands. The sample clearly exhibited the Fermi edge singularity (FES) peak in its photoluminescence spectrum at 10-300 K; and the FES peak was analyzed in terms of the phenomenological line shape model with key physical parameters such as the Fermi energy, the hole localization energy, and the band-to-band transition amplitude. Through the comprehensive studies on both the theoretical calculation and the experimental evaluation of the energy band profile, we found out that the localized state, which is separated above by ~0.07 eV from the first excited hole-subband, corresponds to the deep-level state, residing at the position of ~0.75 eV far below the conduction band (i.e., near the valence band edge).

摘要

在包含两个量子限制电子态和两个空穴子带的InAlAs/InGaAs量子阱结构中,观察到了光学局域态与电学深能级缺陷态之间的特殊关联。该样品在10 - 300 K的光致发光光谱中清晰地展现出费米边奇异(FES)峰;并且根据具有诸如费米能量、空穴局域能量和带间跃迁幅度等关键物理参数的唯象线形模型对FES峰进行了分析。通过对能带分布的理论计算和实验评估的综合研究,我们发现,与第一激发空穴子带在能量上相隔约0.07 eV的局域态对应于深能级态,该深能级态位于导带下方约0.75 eV处(即靠近价带边缘)。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b141/7996928/2bfbc9f4c4eb/nanomaterials-11-00585-g001.jpg

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