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通过电流-电压特性和深能级瞬态谱研究InP/InGaAs/InP异质结构中的缺陷态

Defect States in InP/InGaAs/InP Heterostructures by Current-Voltage Characteristics and Deep Level Transient Spectroscopy.

作者信息

Vu Thi Kim Oanh, Lee Kyoung Su, Lee Sang Jun, Kim Eun Kyu

机构信息

Department of Physics and Research Institute for Convergence of Basic Sciences, Hanyang University, Seoul 04763, Korea.

Division of Convergence Technology, Korea Research Institute of Standards and Science, Daejeon 34113, Korea.

出版信息

J Nanosci Nanotechnol. 2018 Sep 1;18(9):6239-6243. doi: 10.1166/jnn.2018.15625.

Abstract

We studied defect states in In0.53Ga0.47As/InP heterojunctions with interface control by group V atoms during metalorganic chemical vapor (MOCVD) deposition. From deep level transient spectroscopy (DLTS) measurements, two defects with activation energies of 0.28 eV (E1) and 0.15 eV (E2) below the conduction band edge, were observed. The defect density of E1 for In0.53Ga0.47As/InP heterojunctions with an addition of As and P atoms was about 1.5 times higher than that of the heterojunction added P atom only. From the temperature dependence of current- voltage characteristics, the thermal activation energies of In0.53Ga0.47As/InP of heterojunctions were estimated to be 0.27 and 0.25 eV, respectively. It appeared that the reverse light current for In0.53Ga0.47As/InP heterojunction added P atom increased only by illumination of a 940 nm-LED light source. These results imply that only the P addition at the interface can enhance the quality of InGaAs/InP heterojunction.

摘要

我们研究了在金属有机化学气相沉积(MOCVD)过程中通过V族原子进行界面控制的In0.53Ga0.47As/InP异质结中的缺陷态。通过深能级瞬态谱(DLTS)测量,观察到在导带边缘以下具有0.28 eV(E1)和0.15 eV(E2)激活能的两种缺陷。添加As和P原子的In0.53Ga0.47As/InP异质结中E1的缺陷密度比仅添加P原子的异质结高约1.5倍。根据电流-电压特性的温度依赖性,估计In0.53Ga0.47As/InP异质结的热激活能分别为0.27和0.25 eV。似乎添加P原子的In0.53Ga0.47As/InP异质结的反向光电流仅通过940 nm-LED光源的照射而增加。这些结果表明,仅在界面处添加P可以提高InGaAs/InP异质结的质量。

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