• 文献检索
  • 文档翻译
  • 深度研究
  • 学术资讯
  • Suppr Zotero 插件Zotero 插件
  • 邀请有礼
  • 套餐&价格
  • 历史记录
应用&插件
Suppr Zotero 插件Zotero 插件浏览器插件Mac 客户端Windows 客户端微信小程序
定价
高级版会员购买积分包购买API积分包
服务
文献检索文档翻译深度研究API 文档MCP 服务
关于我们
关于 Suppr公司介绍联系我们用户协议隐私条款
关注我们

Suppr 超能文献

核心技术专利:CN118964589B侵权必究
粤ICP备2023148730 号-1Suppr @ 2026

文献检索

告别复杂PubMed语法,用中文像聊天一样搜索,搜遍4000万医学文献。AI智能推荐,让科研检索更轻松。

立即免费搜索

文件翻译

保留排版,准确专业,支持PDF/Word/PPT等文件格式,支持 12+语言互译。

免费翻译文档

深度研究

AI帮你快速写综述,25分钟生成高质量综述,智能提取关键信息,辅助科研写作。

立即免费体验

氧环境中微波和炉退火对 - 型SnO薄膜材料的影响

Effects of Microwave and Furnace Annealing for -Type SnO Thin Film Material in Oxygen Ambient.

作者信息

Zhang Yu-Xin, Wu Chien-Hung, Yeh Li-Wei, Chen Yi-Ming, Chang Kow-Ming, Chang Shih-Ho, Chin Albert

机构信息

College of Electrical and Computing Engineering, National Chiao Tung University, Hsinchu 30010, Taiwan, R.O.C.

Department of Electronics Engineering, Chung Hua University, Hsinchu 30012, Taiwan, R.O.C.

出版信息

J Nanosci Nanotechnol. 2021 Sep 1;21(9):4763-4767. doi: 10.1166/jnn.2021.19257.

DOI:10.1166/jnn.2021.19257
PMID:33691863
Abstract

Transparent conductive oxide (TCO) semiconductors are attracted considerable attention due to a wide range of applications, such as flat panel display (FPD), touch panels, solar cells, and other optoelectronic devices. Owing to the different carrier conduction paths between -type and -type TCOs, the -type TCO used in TFTs usually have high / current ratio (>10) and high electron mobility (>10 cm²/V·s), -type TCO TFTs are both lower than that of -type one. For complementary circuits design and applications, however, both -type and -type semiconductor materials are equally important. For SnO thin films, it is important to adjust the ratio of Sn (SnO -type) and Sn (SnO₂ -type) in order to modulate the electrical characteristics. In this investigation of post treatment for SnO thin films, both microwave annealing (MWA) and furnace annealing process with 0₂ ambient are studied. The results show that SnO thin films are optimized at 300 °C, 30 minutes furnace annealing, the -type SnO/SnO₂ thin film shows surface mean roughness 0.168 nm, [Sn]/[Sn] ratio as 0.838, at least 80% transmittance between 380 nm-700 nm visible light. Withthe results, SnO can be even used to fabricate high performance -type thin film transistors (TFTs) device for future applications.

摘要

透明导电氧化物(TCO)半导体因其在平板显示器(FPD)、触摸屏、太阳能电池和其他光电器件等广泛应用中受到了相当大的关注。由于n型和p型TCO之间的载流子传导路径不同,用于薄膜晶体管(TFT)的n型TCO通常具有高Ion/loff电流比(>10)和高电子迁移率(>10 cm²/V·s),而p型TCO TFTs的这两个参数均低于n型。然而,对于互补电路设计和应用而言,n型和p型半导体材料同样重要。对于SnO薄膜,为了调节其电学特性,调整Sn(SnO n型)和Sn(SnO₂ p型)的比例很重要。在本次对SnO薄膜的后处理研究中,研究了微波退火(MWA)和在O₂环境下的炉退火工艺。结果表明,SnO薄膜在300℃炉退火30分钟时达到优化,p型SnO/SnO₂薄膜的表面平均粗糙度为0.168nm,[Sn]/[Sn]比例为0.838,在380nm - 700nm可见光范围内的透过率至少为80%。基于这些结果,SnO甚至可用于制造高性能的p型薄膜晶体管(TFT)器件以供未来应用。

相似文献

1
Effects of Microwave and Furnace Annealing for -Type SnO Thin Film Material in Oxygen Ambient.氧环境中微波和炉退火对 - 型SnO薄膜材料的影响
J Nanosci Nanotechnol. 2021 Sep 1;21(9):4763-4767. doi: 10.1166/jnn.2021.19257.
2
Low-voltage operation of ZrO2-gated n-type thin-film transistors based on a channel formed by hybrid phases of SnO and SnO2.基于由SnO和SnO2混合相形成的沟道的ZrO2栅控n型薄膜晶体管的低压操作。
ACS Appl Mater Interfaces. 2015 Jul 22;7(28):15129-37. doi: 10.1021/acsami.5b02941. Epub 2015 Jul 13.
3
Effects of -Type SnO Thin-Film Transistors with N₂ and O₂ Ambient Furnace Annealing.采用氮气和氧气环境炉退火的 - 型氧化锡薄膜晶体管的效应
J Nanosci Nanotechnol. 2020 Jul 1;20(7):4069-4072. doi: 10.1166/jnn.2020.17554.
4
Composition, Microstructure, and Electrical Performance of Sputtered SnO Thin Films for p-Type Oxide Semiconductor.溅射 SnO 薄膜的组成、微观结构和电性能研究及其在 p 型氧化物半导体中的应用。
ACS Appl Mater Interfaces. 2018 Jan 31;10(4):3810-3821. doi: 10.1021/acsami.7b17906. Epub 2018 Jan 22.
5
Highly Dense and Stable p-Type Thin-Film Transistor Based on Atomic Layer Deposition SnO Fabricated by Two-Step Crystallization.基于两步结晶法通过原子层沉积制备的SnO的高致密且稳定的p型薄膜晶体管。
ACS Appl Mater Interfaces. 2021 Jul 7;13(26):30818-30825. doi: 10.1021/acsami.1c06038. Epub 2021 Jun 22.
6
Lowering the Trap-State Density of Transparent Amorphous Oxide Semiconductor-Based Thin Film Transistors Through Microwave Irradiation.通过微波辐照降低基于透明非晶氧化物半导体的薄膜晶体管的陷阱态密度
J Nanosci Nanotechnol. 2020 Nov 1;20(11):6920-6924. doi: 10.1166/jnn.2020.18811.
7
The Effect of Microwave Annealing of Reliability Characteristics on Amorphous IGZO Thin Film Transistors.微波退火对非晶铟镓锌氧化物薄膜晶体管可靠性特性的影响
J Nanosci Nanotechnol. 2019 Apr 1;19(4):2189-2192. doi: 10.1166/jnn.2019.15996.
8
Atomically Thin Tin Monoxide-Based p-Channel Thin-Film Transistor and a Low-Power Complementary Inverter.基于原子级薄一氧化锡的p沟道薄膜晶体管及低功耗互补反相器
ACS Appl Mater Interfaces. 2021 Nov 10;13(44):52783-52792. doi: 10.1021/acsami.1c15990. Epub 2021 Nov 1.
9
Room-Temperature Fabrication of p-Type SnO Semiconductors Using Ion-Beam-Assisted Deposition.利用离子束辅助沉积在室温下制备p型SnO半导体
ACS Appl Mater Interfaces. 2022 Oct 19;14(41):46726-46737. doi: 10.1021/acsami.2c12617. Epub 2022 Oct 6.
10
Effect of the Active Channel Thickness Variation in Amorphous In-Zn-Sn-O Thin Film Transistor.非晶铟锌锡氧化物薄膜晶体管中有源沟道厚度变化的影响
J Nanosci Nanotechnol. 2019 Mar 1;19(3):1686-1689. doi: 10.1166/jnn.2019.16251.