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氢掺杂的钕铁砷超导薄膜的高J值和低各向异性

High J and low anisotropy of hydrogen doped NdFeAsO superconducting thin film.

作者信息

Iida Kazumasa, Hänisch Jens, Kondo Keisuke, Chen Mingyu, Hatano Takafumi, Wang Chao, Saito Hikaru, Hata Satoshi, Ikuta Hiroshi

机构信息

Department of Materials Physics, Nagoya University, Chikusa-ku, Nagoya, 464-8603, Japan.

JST CREST, Kawaguchi, Saitama, 332-0012, Japan.

出版信息

Sci Rep. 2021 Mar 11;11(1):5636. doi: 10.1038/s41598-021-85216-3.

Abstract

The recent realisations of hydrogen doped LnFeAsO (Ln = Nd and Sm) superconducting epitaxial thin films call for further investigation of their structural and electrical transport properties. Here, we report on the microstructure of a NdFeAs(O,H) epitaxial thin film and its temperature, field, and orientation dependencies of the resistivity and the critical current density J. The superconducting transition temperature T is comparable to NdFeAs(O,F). Transmission electron microscopy investigation supported that hydrogen is homogenously substituted for oxygen. A high self-field J of over 10 MA/cm was recorded at 5 K, which is likely to be caused by a short London penetration depth. The anisotropic Ginzburg-Landau scaling for the angle dependence of J yielded temperature-dependent scaling parameters γ that decreased from 1.6 at 30 K to 1.3 at 5 K. This is opposite to the behaviour of NdFeAs(O,F). Additionally, γ of NdFeAs(O,H) is smaller than that of NdFeAs(O,F). Our results indicate that heavily electron doping by means of hydrogen substitution for oxygen in LnFeAsO is highly beneficial for achieving high J with low anisotropy without compromising T, which is favourable for high-field magnet applications.

摘要

近期实现的氢掺杂LnFeAsO(Ln = Nd和Sm)超导外延薄膜,需要对其结构和电输运性质进行进一步研究。在此,我们报道了NdFeAs(O,H)外延薄膜的微观结构及其电阻率和临界电流密度J随温度、磁场和取向的变化关系。超导转变温度T与NdFeAs(O,F)相当。透射电子显微镜研究表明,氢均匀地替代了氧。在5 K时记录到超过10 MA/cm的高自场J,这可能是由较短的伦敦穿透深度引起的。J的角度依赖性的各向异性金兹堡 - 朗道标度给出了随温度变化的标度参数γ,其从30 K时的1.6降至5 K时的1.3。这与NdFeAs(O,F)的行为相反。此外,NdFeAs(O,H)的γ小于NdFeAs(O,F)的γ。我们的结果表明,通过用氢替代LnFeAsO中的氧进行重电子掺杂,对于在不降低T的情况下实现低各向异性的高J非常有利,这对高场磁体应用是有利的。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/0416/7952916/272c3db7c825/41598_2021_85216_Fig1_HTML.jpg

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