Samudrala Gopi, Chakrabarty Kallol, Baker Paul A, Tucker Bernabe S, Vohra Yogesh K, Catledge Shane A
Department of Physics, University of Alabama at Birmingham, Birmingham, AL 35294, USA.
Department of Materials Science & Engineering, University of Alabama at Birmingham, Birmingham, AL 35294, USA.
Materials (Basel). 2021 Mar 13;14(6):1397. doi: 10.3390/ma14061397.
Boron-rich B-C compounds with high hardness have been recently synthesized by the chemical vapor deposition (CVD) method. In this paper, we present our successful efforts in the selective growth of microstructures of boron-carbon compounds on silicon substrates. This was achieved by combining microfabrication techniques such as maskless lithography and sputter deposition with the CVD technique. Our characterization studies on these B-C microstructures showed that they maintain structural and mechanical properties similar to that of their thin-film counterparts. The methodology presented here paves the way for the development of microstructures for microelectromechanical system (MEMS) applications which require custom hardness and strength properties. These hard B-C microstructures are an excellent choice as support structures in MEMS-based devices.
最近通过化学气相沉积（CVD）方法合成了具有高硬度的富硼硼碳化合物。在本文中，我们展示了在硅衬底上选择性生长硼碳化合物微结构的成功尝试。这是通过将无掩膜光刻和溅射沉积等微加工技术与CVD技术相结合来实现的。我们对这些硼碳微结构的表征研究表明，它们保持了与其薄膜对应物相似的结构和机械性能。这里介绍的方法为开发用于微机电系统（MEMS）应用的微结构铺平了道路，这些应用需要定制的硬度和强度特性。这些坚硬的硼碳微结构是基于MEMS的器件中作为支撑结构的极佳选择。
