College of Environmental Science and Engineering, State Environmental Protection Engineering Center for Pollution Treatment and Control in Textile Industry, Donghua University, Shanghai 201620, China.
Key Laboratory of Jiangxi Province for Persistent Pollutants Control and Resources Recycle, Nanchang Hangkong University, Nanchang 330063, China.
J Hazard Mater. 2021 Aug 15;416:125772. doi: 10.1016/j.jhazmat.2021.125772. Epub 2021 Mar 31.
Ion imprinted polymers exhibit great potential in ion separation from wastewater. However, the difficulty of ion separation by membrane is proverbial, which severely restricts the application of membrane in metal resource recovery from industrial wastewater. Herein, a rational molecular-level design approaches for membrane fabrication was developed to modify a layer of ion imprinted polymer onto the PVDF membrane. Batch rebind and permeation experiments suggest that specific host-guest binding sites had been fabricated along the membrane pore in ion imprinted membranes (IIM). A higher monomer dose leads to a higher rejection of Cd, and the more bind sites in IIM. The binding of IIM to Cd was 1.84 times that of non-ion imprinted membranes (NIM). Permselectivity factors (γ) of IIM are larger than 5.39 in mixture ions solutions. Chemical characterization and density functional theory (DFT) calculation reveal that the Cd recognition sites of functional groups are C-S and C˭S. Cd mass transport in IIM suggest that the imprint effects provide a binding force that would delay Cd to permeate through IIM, so as to selectively separate Cd with other ions. The imprint effects may enlighten a novel molecular-level design approaches for membrane fabrication to enhance the selectivity of ion-ion.
离子印迹聚合物在从废水中分离离子方面具有巨大的潜力。然而,膜分离的难度是众所周知的,这严重限制了膜在从工业废水中回收金属资源方面的应用。在此,开发了一种合理的分子水平的膜制备设计方法,将一层离子印迹聚合物修饰到 PVDF 膜上。批量再结合和渗透实验表明,在离子印迹膜(IIM)中沿膜孔制造了特定的主客体结合位点。更高的单体剂量导致 Cd 的更高排斥率和 IIM 中的更多结合位点。IIM 与 Cd 的结合是未离子印迹膜(NIM)的 1.84 倍。在混合离子溶液中,IIM 的选择性因子(γ)大于 5.39。化学特性和密度泛函理论(DFT)计算表明,功能基团的 Cd 识别位点是 C-S 和 C˭S。在 IIM 中 Cd 的传质表明印迹效应提供了一种结合力,会延迟 Cd 通过 IIM 的渗透,从而选择性地分离 Cd 与其他离子。印迹效应可能为膜制备提供一种新的分子水平的设计方法,以提高离子-离子的选择性。