Beronio Ellaine Rose A, Colambo Ivy R, Padama Allan Abraham B
Institute of Mathematical Sciences and Physics, College of Arts and Sciences, University of the Philippines Los Baños, College, Laguna 4031, Philippines.
Phys Chem Chem Phys. 2021 Apr 14;23(14):8800-8808. doi: 10.1039/d1cp00159k. Epub 2021 Mar 31.
Using density functional theory (DFT) calculations, we examined the effects of substitutional doping on the formation of Cu vacancies in CuO(111). Upon replacing coordinatively unsaturated O with other elements (N, F, P, S, and Cl) and calculating the formation energies, we found that compared to the undoped surface, Cu vacancy formation is most favorable in the F-doped surface and least favorable in the N-doped CuO(111) surface. In addition, we found that in most cases, vacancy formation of the coordinatively saturated Cu has higher vacancy formation energy than coordinatively unsaturated Cu atoms. In the electron localization function plots and the projected charge distributions of the local density of states, we found bonding enhancement between Cu and N in N-CuO(111) but no corresponding enhancement was observed in the F-doped surface. Our results showed that the interaction between the substitutional dopants and the Cu atoms affects the formation of the doped system and the Cu vacancy formation in the surface.
通过密度泛函理论(DFT)计算,我们研究了替代掺杂对CuO(111)中铜空位形成的影响。在用其他元素(N、F、P、S和Cl)取代配位不饱和的O并计算形成能后,我们发现与未掺杂表面相比,铜空位形成在F掺杂表面最有利,而在N掺杂的CuO(111)表面最不利。此外,我们发现,在大多数情况下,配位饱和的Cu的空位形成能比配位不饱和的Cu原子更高。在电子定位函数图和局域态密度的投影电荷分布中,我们发现N-CuO(111)中Cu与N之间的键合增强,但在F掺杂表面未观察到相应的增强。我们的结果表明,替代掺杂剂与Cu原子之间的相互作用影响了掺杂体系的形成以及表面铜空位的形成。