Pavithra Chokkakula L P, Janardhana Reddy Kunda Siri Kiran, Reddy Kolan Madhav, Murapaka Chandrasekhar, Joardar Joydip, Sarada Bulusu V, Tamboli Rameez R, Hu Yixuan, Zhang Yumeng, Wang Xiaodong, Dey Suhash Ranjan
Department of Materials Science and Metallurgical Engineering, Indian Institute of Technology - Hyderabad, Sangareddy, Telangana, 502285, India.
State Key Laboratory of Metal Matrix Composites, School of Materials Science and Engineering, Shanghai Jiao Tong University, Minhang District, Shanghai, 200240, People's Republic of China.
Sci Rep. 2021 Apr 23;11(1):8836. doi: 10.1038/s41598-021-87786-8.
Discovery of advanced soft-magnetic high entropy alloy (HEA) thin films are highly pursued to obtain unidentified functional materials. The figure of merit in current nanocrystalline HEA thin films relies in integration of a simple single-step electrochemical approach with a complex HEA system containing multiple elements with dissimilar crystal structures and large variation of melting points. A new family of Cobalt-Copper-Iron-Nickel-Zinc (Co-Cu-Fe-Ni-Zn) HEA thin films are prepared through pulse electrodeposition in aqueous medium, hosts nanocrystalline features in the range of ~ 5-20 nm having FCC and BCC dual phases. The fabricated Co-Cu-Fe-Ni-Zn HEA thin films exhibited high saturation magnetization value of ~ 82 emu/g, relatively low coercivity value of 19.5 Oe and remanent magnetization of 1.17%. Irrespective of the alloying of diamagnetic Zn and Cu with ferromagnetic Fe, Co, Ni elements, the HEA thin film has resulted in relatively high saturation magnetization which can provide useful insights for its potential unexplored applications.
人们一直在积极探索先进的软磁高熵合金(HEA)薄膜,以获得未知的功能材料。当前纳米晶HEA薄膜的品质因数依赖于将简单的单步电化学方法与复杂的HEA系统相结合,该系统包含具有不同晶体结构和熔点差异较大的多种元素。通过在水介质中脉冲电沉积制备了一种新型的钴-铜-铁-镍-锌(Co-Cu-Fe-Ni-Zn)HEA薄膜,其具有约5-20纳米范围内的纳米晶特征,呈现面心立方(FCC)和体心立方(BCC)双相。制备的Co-Cu-Fe-Ni-Zn HEA薄膜表现出约82 emu/g的高饱和磁化强度值、19.5奥斯特的相对低矫顽力值和1.17%的剩余磁化强度。尽管抗磁性的锌和铜与铁磁性的铁、钴、镍元素合金化,但该HEA薄膜仍具有相对较高的饱和磁化强度,这可为其潜在的未开发应用提供有用的见解。