A critical review on challenges and trend of ultrapure water production process.

The recent and vigorous developments in semiconductor technology strictly request better quality and large quantity of ultrapure water (UPW) for their production. It is crucial to secure a large amount of raw water for the future development of UPW production. Using reclaimed water as alternative raw water source to produce UPW is therefore considered the feasible trend and solution for sustainable use of water resources towards a common future practice in UPW production. The challenge of using reclaimed water is due to its higher content of organic pollutants, especially small molecule organic pollutants such as urea, which are difficult to remove through traditional UPW production process. Consequently, improving the existing UPW production process to meet the water standard desired in the semiconductor industry is essential. This paper reviewed the current traditional processes for removing organic matters in UPW production, including ion-exchange (IX) adsorption, granular activated carbon (GAC) adsorption, reverse osmosis (RO) and ultraviolet (UV) irradiation. The potential problems in the actual UPW production process were identified when using reclaimed water as raw water source. A new strategy of applying the advanced oxidation process (AOPs) to UPW production as a supplementary unit to guarantee UPW quality was proposed. Its feasibility and research focus were then analyzed and discussed in obtaining a new solution for a future development of the UPW production process.