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NbP 外尔半金属薄膜中的大费米能移及平庸表面态的抑制

Large Fermi-Energy Shift and Suppression of Trivial Surface States in NbP Weyl Semimetal Thin Films.

作者信息

Bedoya-Pinto Amilcar, Liu Defa, Tan Hengxin, Pandeya Avanindra Kumar, Chang Kai, Zhang Jibo, Parkin Stuart S P

机构信息

Max Planck-Institute of Microstructure Physics, Weinberg 2, Halle (Saale), 06120, Germany.

出版信息

Adv Mater. 2021 May;33(21):e2008634. doi: 10.1002/adma.202008634. Epub 2021 May 4.

Abstract

Weyl semimetals, a class of 3D topological materials, exhibit a unique electronic structure featuring linear band crossings and disjoint surface states (Fermi-arcs). While first demonstrations of topologically driven phenomena have been realized in bulk crystals, efficient routes to control the electronic structure have remained largely unexplored. Here, a dramatic modification of the electronic structure in epitaxially grown NbP Weyl semimetal thin films is reported, using in situ surface engineering and chemical doping strategies that do not alter the NbP lattice structure and symmetry, retaining its topological nature. Through the preparation of a dangling-bond-free, P-terminated surface which manifests in a surface reconstruction, all the well-known trivial surface states of NbP are fully suppressed, resulting in a purely topological Fermi-arc dispersion. In addition, a substantial Fermi-energy shift from -0.2 to 0.3 eV across the Weyl points is achieved by surface chemical doping, unlocking access to the hitherto unexplored n-type region of the Weyl spectrum. These findings constitute a milestone toward surface-state and Fermi-level engineering of topological bands in Weyl semimetals, and, while there are still challenges in minimizing doping-driven disorder and grain boundary density in the films, they do represent a major advance to realize device heterostructures based on Weyl physics.

摘要

外尔半金属是一类三维拓扑材料,具有独特的电子结构,其特征为线性能带交叉和不相连的表面态(费米弧)。虽然拓扑驱动现象的首次证明已在体晶体中实现,但控制电子结构的有效途径在很大程度上仍未得到探索。在此,报道了通过原位表面工程和化学掺杂策略对外延生长的NbP外尔半金属薄膜的电子结构进行的显著改性,这些策略不会改变NbP晶格结构和对称性,从而保留其拓扑性质。通过制备表现为表面重构的无悬挂键、P端终止表面,NbP所有已知的平凡表面态都被完全抑制,从而产生纯拓扑费米弧色散。此外,通过表面化学掺杂实现了跨外尔点从-0.2到0.3 eV的显著费米能移动,开启了对外尔光谱中迄今未探索的n型区域的研究。这些发现是外尔半金属中拓扑能带的表面态和费米能级工程的一个里程碑,并且,虽然在最小化薄膜中掺杂驱动的无序和晶界密度方面仍存在挑战,但它们确实代表了基于外尔物理实现器件异质结构的一项重大进展。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/fedc/11469305/9c440b4869e9/ADMA-33-2008634-g003.jpg

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