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Origin of the Ir-Si bond shortening in Ir-NSiN complexes.

作者信息

García-Orduña Pilar, Fernández Israel, Oro Luis A, Fernández-Alvarez Francisco J

机构信息

Departamento de Química Inorgánica-Instituto de Síntesis Química y Catálisis Homogénea (ISQCH), Universidad de Zaragoza-CSIC, Facultad de Ciencias, 50009 Zaragoza, Spain.

Departamento de Química Orgánica I and Centro de Innovación en Química Avanzada, Facultad de Ciencias Químicas, Universidad Complutense de Madrid, 28040-Madrid, Spain.

出版信息

Dalton Trans. 2021 May 4;50(17):5951-5959. doi: 10.1039/d1dt00473e.

Abstract

The Ir-Si bond distances reported for Ir-(fac-κ3-NSiNOPy) and Ir-(fac-κ3-NSiN4MeOPy) species (NSiNOPy = bis(pyridine-2-yloxy)methylsilyl and NSiN4MeOPy = bis(4-methyl-pyridine-2-yloxy)methylsily) are in the range of 2.220-2.235 Å. These values are in the lowest limit of the Ir-Si bond distances found in the Cambridge Structural Database (CSD). To understand the origin of such remarkable shortening, a computational study of the bonding situation of representative examples of Ir-(fac-κ3-NSiN) species has been carried out. It is found that the Ir-Si bond can be described as an electron-sharing (i.e. covalent) bond. Despite that, this bond is highly polarized and as a result, the contribution of the electrostatic attractions to the bonding is rather significant. Indeed, there exists a linear relationship (R2 = 0.97) between the Ir-Si bond distance and the extent of the computed electrostatic interactions, which indicates that the ionic contribution to the bonding is mainly responsible for the observed Ir-Si bond shortening.

摘要

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