不同氧化物和混合前驱体对ZIF-8薄膜金属有机框架化学气相沉积的影响。
Effect of different oxide and hybrid precursors on MOF-CVD of ZIF-8 films.
作者信息
Cruz Alexander John, Arnauts Giel, Obst Martin, Kravchenko Dmitry E, Vereecken Philippe M, De Feyter Steven, Stassen Ivo, Hauffman Tom, Ameloot Rob
机构信息
Centre for Membrane Separations, Adsorption, Catalysis, and Spectroscopy for Sustainable Solutions (cMACS), Department of Microbial and Molecular Systems, KU Leuven - University of Leuven, Celestijnenlaan 200F, Leuven, 3001, Belgium.
Division of Molecular Imaging and Photonics, Department of Chemistry, KU Leuven - University of Leuven, Celestijnenlaan 200F, Leuven, 3001, Belgium.
出版信息
Dalton Trans. 2021 May 25;50(20):6784-6788. doi: 10.1039/d1dt00927c.
Chemical vapor deposition of metal-organic frameworks (MOF-CVD) will facilitate the integration of porous and crystalline coatings in electronic devices. In the two-step MOF-CVD process, a precursor layer is first deposited and subsequently converted to a MOF through exposure to linker vapor. We herein report the impact of different metal oxide and metalcone layers as precursors for zeolitic imidazolate framework ZIF-8 films.
金属有机框架的化学气相沉积（MOF-CVD）将促进多孔晶体涂层在电子器件中的集成。在两步MOF-CVD过程中，首先沉积前驱体层，随后通过暴露于连接体蒸汽将其转化为金属有机框架。我们在此报告了不同金属氧化物和金属锥层作为沸石咪唑酯框架ZIF-8薄膜前驱体的影响。
Zotero 插件