Cao Yuan, Floehr Julia, Ingebrandt Sven, Schnakenberg Uwe
Institute of Materials in Electrical Engineering 1, RWTH Aachen University, Sommerfeldstraße 24, 52074 Aachen, Germany.
Helmholtz-Institute for Biomedical Engineering, RWTH Aachen University Hospital, Pauwelsstraße 30, 52074 Aachen, Germany.
Micromachines (Basel). 2021 May 29;12(6):632. doi: 10.3390/mi12060632.
In micro-electrical-mechanical systems (MEMS), thick structures with high aspect ratios are often required. Dry film photoresist (DFR) in various thicknesses can be easily laminated and patterned using standard UV lithography. Here, we present a three-level DFR lamination process of SUEX for a microfluidic chip with embedded, vertically arranged microelectrodes for electrical impedance measurements. To trap and fix the object under test to the electrodes, an aperture is formed in the center of the ring-shaped electrodes in combination with a microfluidic suction channel underneath. In a proof-of-concept, the setup is characterized by electrical impedance measurements with polystyrene and ZrO spheres. The electrical impedance is most sensitive at approximately 2 kHz, and its magnitudes reveal around 200% higher values when a sphere is trapped. The magnitude values depend on the sizes of the spheres. Electrical equivalent circuits are applied to simulate the experimental results with a close match.
在微机电系统(MEMS)中,通常需要具有高纵横比的厚结构。各种厚度的干膜光刻胶(DFR)可以使用标准紫外光刻轻松层压和构图。在此,我们展示了一种用于具有嵌入式垂直排列微电极以进行电阻抗测量的微流控芯片的SUEX三级DFR层压工艺。为了将被测物体捕获并固定到电极上,在环形电极的中心形成一个孔,并在其下方结合一个微流控抽吸通道。在概念验证中,该装置通过使用聚苯乙烯和ZrO球体进行电阻抗测量来表征。电阻抗在约2 kHz时最敏感,当捕获一个球体时,其幅度显示出高约200%的值。幅度值取决于球体的大小。应用等效电路对实验结果进行模拟,结果匹配良好。