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利用阴极发光成像量子阱中埋藏的非辐射点缺陷。

Imaging Nonradiative Point Defects Buried in Quantum Wells Using Cathodoluminescence.

作者信息

Weatherley Thomas F K, Liu Wei, Osokin Vitaly, Alexander Duncan T L, Taylor Robert A, Carlin Jean-François, Butté Raphaël, Grandjean Nicolas

机构信息

Institute of Physics, Ecole Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.

Department of Physics, The Clarendon Laboratory, University of Oxford, Oxford OX1 3PU, United Kingdom.

出版信息

Nano Lett. 2021 Jun 23;21(12):5217-5224. doi: 10.1021/acs.nanolett.1c01295. Epub 2021 Jun 4.

Abstract

Crystallographic point defects (PDs) can dramatically decrease the efficiency of optoelectronic semiconductor devices, many of which are based on quantum well (QW) heterostructures. However, spatially resolving individual nonradiative PDs buried in such QWs has so far not been demonstrated. Here, using high-resolution cathodoluminescence (CL) and a specific sample design, we spatially resolve, image, and analyze nonradiative PDs in InGaN/GaN QWs at the nanoscale. We identify two different types of PDs by their contrasting behavior with temperature and measure their densities from 10 cm to as high as 10 cm. Our CL images clearly illustrate the interplay between PDs and carrier dynamics in the well: increasing PD concentration severely limits carrier diffusion lengths, while a higher carrier density suppresses the nonradiative behavior of PDs. The results in this study are readily interpreted directly from CL images and represent a significant advancement in nanoscale PD analysis.

摘要

晶体学点缺陷(PDs)会显著降低许多基于量子阱(QW)异质结构的光电子半导体器件的效率。然而,迄今为止尚未证明能够在空间上分辨埋入此类量子阱中的单个非辐射点缺陷。在此,我们利用高分辨率阴极发光(CL)和特定的样品设计,在纳米尺度上对InGaN/GaN量子阱中的非辐射点缺陷进行空间分辨、成像和分析。我们根据它们与温度的不同行为识别出两种不同类型的点缺陷,并测量了它们从10¹⁰ cm⁻³到高达10¹² cm⁻³的密度。我们的CL图像清楚地说明了量子阱中点缺陷与载流子动力学之间的相互作用:点缺陷浓度的增加严重限制了载流子扩散长度,而较高的载流子密度则抑制了点缺陷的非辐射行为。本研究结果可直接从CL图像中轻松解读,代表了纳米尺度点缺陷分析的重大进展。

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