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点缺陷工程:共掺杂协同效应实现n型Bi₂Te热电材料的卓越性能

Point Defect Engineering: Co-Doping Synergy Realizing Superior Performance in n-Type Bi Te Thermoelectric Materials.

作者信息

Zhu Bin, Wang Wu, Cui Juan, He Jiaqing

机构信息

Shenzhen Key Laboratory of Thermoelectric Materials, Department of Physics, and Guangdong Provincial Key Laboratory of Energy Materials for Electric Power, Southern University of Science and Technology, Shenzhen, 518055, China.

出版信息

Small. 2021 Jul;17(29):e2101328. doi: 10.1002/smll.202101328. Epub 2021 Jun 17.

Abstract

Bi Te has attracted great attention because of its excellent thermoelectric (TE) performance around room temperature. However, the TE property of the n-type Bi Te is still relatively low compared to the p-type counterpart, which seriously hinders its commercial application with a combination of the n-type and p-type materials. Herein, an effective process of Cl and W co-doping is employed into the n-type Bi Te materials to enhance its TE properties. The Bi W Te Cl Se sample achieves a peak and average ZT over 1.3 and 1.2, respectively, at temperature range of 300-575 K. A 24-leg TE module of this n-type material and a home-made p-type Bi Te sample can produce a high efficiency over 6% at a temperature gradient of 235 K, which possesses a 71% improvement compared with a commercial Bi Te module. This high performance is ascribed to the effect of the Cl and W doping. This co-doping not only significantly increases the Grüneisen parameter but also successfully induces interstitial atoms in the van der Waals gap, which lead to a low lattice thermal conductivity (κ ) of 0.31W m K and a boosted charge transport. This finding represents an important step to promote the development of the n-type Bi Te materials.

摘要

碲化铋因其在室温附近出色的热电性能而备受关注。然而,与p型碲化铋相比,n型碲化铋的热电性能仍然相对较低,这严重阻碍了其与p型材料结合的商业应用。在此,采用一种有效的氯和钨共掺杂工艺来提高n型碲化铋材料的热电性能。在300 - 575K的温度范围内,Bi₂WTe₃ClSe样品的峰值ZT和平均ZT分别超过1.3和1.2。这种n型材料的24腿热电模块与自制的p型碲化铋样品在235K的温度梯度下可产生超过6%的高效率,与商用碲化铋模块相比提高了71%。这种高性能归因于氯和钨掺杂的效果。这种共掺杂不仅显著增加了格林艾森参数,还成功地在范德华间隙中诱导出间隙原子,这导致了0.31W m⁻¹K⁻¹的低晶格热导率(κL)和增强的电荷传输。这一发现代表了推动n型碲化铋材料发展的重要一步。

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