iBET - Instituto de Biologia Experimental e Tecnológica, Apartado 12, 2780-901 Oeiras, Portugal; Instituto de Tecnologia Química e Biológica António Xavier, Universidade Nova de Lisboa, Av. da República, 2780-157 Oeiras, Portugal.
iBET - Instituto de Biologia Experimental e Tecnológica, Apartado 12, 2780-901 Oeiras, Portugal.
J Photochem Photobiol B. 2021 Aug;221:112242. doi: 10.1016/j.jphotobiol.2021.112242. Epub 2021 Jun 12.
The aim of this work is to understand the inactivation efficiency of medium pressure mercury lamps, measured in terms of growth inhibition as well as cell death, damage and response, using three strains from three different Aspergillus species (A. fumigatus, A. niger and, A. terreus) spiked in filtered surface water. A complete characterization of the effect of the treatment on each strain of the fungal species was assessed considering spores' morphology, cell wall integrity and enzymatic activity, the formation of pyrimidine dimers in the DNA and proteome analysis. Results showed that, when subjected to medium pressure mercury lamps, A. niger is the most resistant to inactivation, that both A. fumigatus and A. niger suffer more morphological changes and present a higher number of damaged spores and A. terreus presented more dead spores. DNA damages detected in A. niger were able to be repaired to some extent, under both light and dark conditions. Finally, proteome analysis showed that the UV radiation treatment triggered different types of stress response, including cell wall reorganization and DNA repair in A. fumigatus and A. terreus, and oxidative stress responses like the increase in production of citric acid and itaconic acid in A. niger and A. terreus, respectively.
本工作旨在研究中压汞灯的灭活效率，以过滤后的地表水为载体，采用 3 株来自 3 种不同曲霉属（烟曲霉、黑曲霉和土曲霉）的菌株为研究对象，通过生长抑制、细胞死亡、损伤和反应等指标进行评估。从孢子形态、细胞壁完整性和酶活性、DNA 嘧啶二聚体形成以及蛋白质组分析等方面，全面评估了处理对每种真菌菌株的影响。结果表明，中压汞灯照射下，黑曲霉的抗失活能力最强，烟曲霉和黑曲霉的形态变化较大，受损孢子数量较多，而土曲霉的失活孢子数量较多。在光照和黑暗条件下，黑曲霉的 DNA 损伤均在一定程度上得到修复。最后，蛋白质组分析表明，UV 辐射处理引发了不同类型的应激反应，包括烟曲霉和土曲霉的细胞壁重组和 DNA 修复，以及黑曲霉和土曲霉的柠檬酸和衣康酸的产生增加等氧化应激反应。
