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六方氮化硼纳米带的原子精确纹理化

Atomically-Precise Texturing of Hexagonal Boron Nitride Nanostripes.

作者信息

Ali Khadiza, Fernández Laura, Kherelden Mohammad A, Makarova Anna A, Píš Igor, Bondino Federica, Lawrence James, de Oteyza Dimas G, Usachov Dmitry Yu, Vyalikh Denis V, García de Abajo F Javier, El-Fattah Zakaria M Abd, Ortega J Enrique, Schiller Frederik

机构信息

Centro de Física de Materiales CSIC/UPV-EHU-Materials Physics Center, San Sebastián, E-20018, Spain.

Universidad del País Vasco, Dpto. Física Aplicada, San Sebastián, E-20018, Spain.

出版信息

Adv Sci (Weinh). 2021 Sep;8(17):e2101455. doi: 10.1002/advs.202101455. Epub 2021 Jul 22.

Abstract

Monolayer hexagonal boron nitride (hBN) is attracting considerable attention because of its potential applications in areas such as nano- and opto-electronics, quantum optics and nanomagnetism. However, the implementation of such functional hBN demands precise lateral nanostructuration and integration with other two-dimensional materials, and hence, novel routes of synthesis beyond exfoliation. Here, a disruptive approach is demonstrated, namely, imprinting the lateral pattern of an atomically stepped one-dimensional template into a hBN monolayer. Specifically, hBN is epitaxially grown on vicinal Rhodium (Rh) surfaces using a Rh curved crystal for a systematic exploration, which produces a periodically textured, nanostriped hBN carpet that coats Rh(111)-oriented terraces and lattice-matched Rh(337) facets with tunable width. The electronic structure reveals a nanoscale periodic modulation of the hBN atomic potential that leads to an effective lateral semiconductor multi-stripe. The potential of such atomically thin hBN heterostructure for future applications is discussed.

摘要

单层六方氮化硼(hBN)因其在纳米电子学、光电子学、量子光学和纳米磁学等领域的潜在应用而备受关注。然而,要实现这种功能性hBN,需要精确的横向纳米结构化以及与其他二维材料的集成,因此,除了剥离法之外还需要新的合成路线。在此,展示了一种突破性的方法,即将原子级阶梯状一维模板的横向图案压印到hBN单层中。具体而言,使用Rh弯曲晶体在近邻铑(Rh)表面上外延生长hBN,以便进行系统探索,从而产生周期性纹理化的纳米条纹hBN毯,该毯覆盖Rh(111)取向的平台和晶格匹配的Rh(337)小面,且宽度可调。电子结构揭示了hBN原子势的纳米级周期性调制,这导致了有效的横向半导体多条纹。讨论了这种原子级薄的hBN异质结构在未来应用中的潜力。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/321e/8425884/7317f42bf102/ADVS-8-2101455-g004.jpg

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