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比较 Bolt-Connected 外部脑室引流与 Tunneled 外部脑室引流 - 叙述性综述和荟萃分析。

Comparison of a bolt-connected external ventricular drain with a tunneled external ventricular drain - a narrative review and meta-analysis.

机构信息

Department of Neurosurgery, All India Institute of Medical Sciences, New Delhi, India.

出版信息

Neurosurg Rev. 2022 Apr;45(2):937-949. doi: 10.1007/s10143-021-01639-6. Epub 2021 Sep 7.

Abstract

External ventricular drain (EVD) is one of the most commonly performed neurosurgical procedures. EVD can be associated with high rates of complications like misplacement, iatrogenic hemorrhage, and CSF infection. Several modifications have been proposed in the EVD insertion techniques to decrease the risk of these complications. Bolt-connected EVD, one of these modifications which involves insertion of a bolt in the burr hole, has been proposed to have better chances of optimal placement of EVD tip, lesser risk of CSF infection, and accidental pullout. A comprehensive search of different databases was performed to retrieve studies comparing the bolt-connected EVD with tunneled EVD and meta-analysis was done. Seven studies met inclusion criteria and were included in the meta-analysis. Our analysis revealed that bolt-connected EVD is associated with significantly better chances of optimal placement than traditional tunneled EVD (MH OR-1.65, 95% CI 1.14 to 2.40, p = 0.008). We also observed that bolt-connected EVD is associated with significantly decreased risk of CSF infection (MH OR-0.60, 95% CI 0.39 to 0.94, p = 0.026), EVD malfunction (MH OR-0.31, 95% CI 0.16 to 0.58, p = 0.0003), and accidental disconnection (MH OR-0.09, 95% CI 0.03 to 0.26, p < 0.0001) as compared to traditional tunneled EVD. The difference between the two techniques was not statistically significant for complications, multiple punctures done for insertion of EVD, iatrogenic intracranial, and need of reoperation. Bolt-connected external ventricular drain is associated with significantly more chances of optimal placement and lesser chances of accidental discontinuation and CSF infection than tunneled EVD. There was no statistically significant difference noted between the two techniques for multiple punctures done for insertion of EVD, iatrogenic intracranial hemorrhage and need of reoperation. However, most of the included studies were retrospective. Thus, the results from the meta-analysis should be interpreted with caution as further prospective high-quality studies are needed.

摘要

外部脑室引流(EVD)是最常进行的神经外科手术之一。EVD 可能会引起很高的并发症发生率,如位置不当、医源性出血和 CSF 感染。已经提出了几种 EVD 插入技术的改进方法,以降低这些并发症的风险。其中一种改进方法是在颅骨钻孔中插入螺栓,即螺栓连接 EVD,据报道这种方法可以更好地优化 EVD 尖端的位置,降低 CSF 感染的风险,并减少意外拔出的风险。我们进行了全面的数据库检索,以检索比较螺栓连接 EVD 与隧道式 EVD 的研究,并进行了荟萃分析。符合纳入标准的 7 项研究被纳入荟萃分析。我们的分析表明,与传统的隧道式 EVD 相比,螺栓连接 EVD 具有更好的优化放置机会(MH OR-1.65,95%CI 1.14 至 2.40,p=0.008)。我们还观察到,与传统的隧道式 EVD 相比,螺栓连接 EVD 与 CSF 感染风险降低(MH OR-0.60,95%CI 0.39 至 0.94,p=0.026)、EVD 故障(MH OR-0.31,95%CI 0.16 至 0.58,p=0.0003)和意外断开(MH OR-0.09,95%CI 0.03 至 0.26,p<0.0001)的风险降低相关。与传统的隧道式 EVD 相比,两种技术在并发症、EVD 插入所需的多次穿刺、医源性颅内出血和需要再次手术方面没有统计学上的显著差异。螺栓连接的外部脑室引流与隧道式 EVD 相比,具有更好的优化放置机会,意外断开和 CSF 感染的机会更少。两种技术在 EVD 插入所需的多次穿刺、医源性颅内出血和需要再次手术方面没有统计学上的显著差异。然而,大多数纳入的研究都是回顾性的。因此,荟萃分析的结果应谨慎解释,因为需要进一步进行前瞻性高质量研究。

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