Department of Neurosurgery, Institute of Clinical Medicine, Aalborg University Hospital, Hobrovej 18-22, 9100, Aalborg, Denmark.
Acta Neurochir (Wien). 2019 Jan;161(1):33-39. doi: 10.1007/s00701-018-3737-z. Epub 2018 Nov 23.
Acutely increased intracranial pressure (ICP) is frequently managed by external ventricular drainage (EVD). This procedure is life-saving but marred by a high incidence of complications. It has recently been indicated that bolt-connected external ventricular drainage (BC-EVD) compared to the standard technique of tunnelled EVD (T-EVD) may result in less complications.
To prospectively sample and compare two cohorts by consecutive allocation to either BC-EVD or T-EVD from the introduction of the BC-EVD technique in our department and 12 months onward.
Patients undergoing ventriculostomy between the 1st of March 2017 and the 28th of February 2018 were considered for inclusion. The neurosurgeon on-call sovereignly set the indication and decided on EVD type (BC-EVD or T-EVD), consequently resulting in two cohorts as 3/7 senior neurosurgeons on call were open to the use of BC-EVD, while 4/7 were reluctant to use this technique. Data was continuously collected using patient records, including results of cerebrospinal fluid (CSF) culturing and available CT/MRI-scans. Recorded complications included CSF leakage, accidental discontinuation, placement-related intracranial haemorrhage, malfunction, migration, infection and revision.
Forty-nine EVDs (32 T-EVDs/17 BC-EVDs) were included; 19/32 (59.4%) T-EVDs and 3/17 (17.6%) BC-EVDs were found to have complications (p = 0.007). The relative risk of complications when using T-EVD was 3.4 times that of BC-EVD.
Ventriculostomy by BC-EVD compared to T-EVD reduces incidence and risk of complications and should be the first choice in EVD placement. That said, T-EVD has a role in paediatric patients and for intraoperatively and occipitally placed EVDs.
急性颅内压升高(ICP)常通过外部脑室引流(EVD)进行治疗。虽然该操作具有救命作用,但却存在较高的并发症发生率。最近有研究表明,与标准的经隧道 EVD(T-EVD)相比,螺栓连接的外部脑室引流(BC-EVD)可能会导致更少的并发症。
从我们科室引入 BC-EVD 技术开始,前瞻性地连续对两组患者进行采样,并对其进行比较,分为 BC-EVD 组和 T-EVD 组,时间为 12 个月。
纳入在 2017 年 3 月 1 日至 2018 年 2 月 28 日期间行脑室造瘘术的患者。值班神经外科医生根据需要自行决定使用哪种 EVD(BC-EVD 或 T-EVD),这导致产生了两个队列,其中 3/7 名值班的高级神经外科医生愿意使用 BC-EVD,而 4/7 名神经外科医生不愿意使用这种技术。使用患者病历连续收集数据,包括脑脊液(CSF)培养结果和现有的 CT/MRI 扫描结果。记录的并发症包括 CSF 渗漏、意外中断、与放置相关的颅内出血、故障、迁移、感染和修正。
共纳入 49 例 EVD(32 例 T-EVD/17 例 BC-EVD);32 例 T-EVD 中有 19 例(59.4%)和 17 例 BC-EVD 中有 3 例(17.6%)发生并发症(p=0.007)。使用 T-EVD 时并发症的相对风险是 BC-EVD 的 3.4 倍。
与 T-EVD 相比,BC-EVD 行脑室造瘘术可降低并发症的发生率和风险,应成为 EVD 放置的首选方法。但 T-EVD 在儿科患者、术中放置和枕部放置的 EVD 中仍有其作用。