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手性金属表面上的不对称消除反应。

Asymmetric Elimination Reaction on Chiral Metal Surfaces.

作者信息

Stolz Samuel, Danese Martina, Di Giovannantonio Marco, Urgel José I, Sun Qiang, Kinikar Amogh, Bommert Max, Mishra Shantanu, Brune Harald, Gröning Oliver, Passerone Daniele, Widmer Roland

机构信息

Nanotech@surfaces Laboratory, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf, CH-8600, Switzerland.

Institute of Physics, École Polytechnique Fédérale de Lausanne, Lausanne, CH-1015, Switzerland.

出版信息

Adv Mater. 2022 Jan;34(2):e2104481. doi: 10.1002/adma.202104481. Epub 2021 Nov 11.

Abstract

The production of enantiopure materials and molecules is of uttermost relevance in research and industry in numerous contexts, ranging from nonlinear optics to asymmetric synthesis. In the context of the latter, dehalogenation, which is an essential reaction step for a broad class of chemical reactions, is investigated; specifically, dehalogenation of prochiral 5-bromo-7-methylbenz(a)anthracene (BMA) on prototypical, chiral, intermetallic PdGa{111} surfaces under ultrahigh vacuum conditions. Asymmetric halogen elimination is demonstrated by combining temperature-programmed X-ray photoelectron spectroscopy, scanning probe microscopy, and density functional theory. On the PdGa{111} surfaces, the difference in debromination temperatures for the two BMA surface enantiomers amounts up to an unprecedented 46 K. The significant dependence of the dehalogenation temperature of the BMA surface enantiomers on the atomic termination of the PdGa{111} surfaces implies that the ensemble effect is pronounced in this reaction step. These findings evidence enantiospecific control and hence promote intrinsically chiral crystals for asymmetric on-surface synthesis.

摘要

对映体纯材料和分子的生产在众多研究和工业领域中都极为重要,涵盖从非线性光学到不对称合成等诸多方面。在后一种情况下,研究了脱卤反应,它是一类广泛化学反应的关键反应步骤;具体而言,是在超高真空条件下,研究原型手性金属间化合物PdGa{111}表面上手性前体5-溴-7-甲基苯并(a)蒽(BMA)的脱卤反应。通过结合程序升温X射线光电子能谱、扫描探针显微镜和密度泛函理论,证明了不对称卤消除反应。在PdGa{111}表面上,两种BMA表面对映体的脱溴温度差异高达前所未有的46K。BMA表面对映体的脱卤温度对PdGa{111}表面原子终止的显著依赖性表明,在该反应步骤中整体效应很明显。这些发现证明了对映体特异性控制,从而推动了用于不对称表面合成的本征手性晶体的发展。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/928e/11469205/13685e4a1c4b/ADMA-34-2104481-g003.jpg

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